IP Library Granted Patent US 10,347,603
Granted Patent B2
US 10,347,603 · App. 15/061,970 · Granted Jul 9, 2019

Semiconductor device manufacturing apparatus and method

Inventor: Masayuki Miura (Mie, JP)
Assignee: TOSHIBA MEMORY CORPORATION
H01L24/75H01L24/81H01L2224/131H01L2224/7592H01L2224/75251H01L2224/75252H01L2224/75502H01L2224/75745H01L2224/75753H01L2224/81193H01L2224/81203
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Quick Facts
Patent No.
US 10,347,603
App. No.
15/061,970
Granted
Jul 9, 2019
Kind
B2
Abstract

A semiconductor device manufacturing apparatus includes a stage, a head section facing the stage and configured to hold a semiconductor element, a driving section configured to drive one of the head section and the stage to move in a first direction intersecting the head section and the stage and apply a load to the other one of the stage and the head section, a load sensor configured to sense a load value of the applied load, and a controller configured to control the driving section to move one of the head section and the stage, and then separate the head section from the stage in accordance with a change in the load value.

Claims (32)

1. A method of manufacturing a semiconductor device using a semiconductor device manufacturing apparatus including a stage configured to hold a substrate, a head section facing the stage and configured to hold a semiconductor element, a driving section configured to drive one of the head section and the stage to move relative to one another in a first direction intersecting the head section and the stage and apply a load to the other one of the head section and the stage, a load sensor configured to sense a load value of the applied load, and a heating portion configured to heat the head section, the method comprising:

moving one of the head section and the stage in the first direction towards the other with the driving section and applying the load to the other until the load value becomes a first value;

moving the head section away from the stage with the driving section to reduce the applied load until the load value becomes a second value which is smaller than the first value;

after the semiconductor element is pressed against the stage with the reduced load, heating the head section with the heating portion;

terminating the heating after a period of time to allow the head section to cool;

during the cooling of the head section, maintaining a desired distance between the stage and the head section by moving one of the head section and the stage in the first direction towards the other one of the head section and the stage with the driving section; and

separating the semiconductor element from the head section in accordance with a change in the load value.

2. The method according to claim 1 , further comprising:

after the semiconductor element is separated from the head section, moving one of the head section and the stage away from the other.

3. The method according to claim 1 , wherein

a metal bump is provided on one of the substrate and the semiconductor element and a metal electrode is provided on the other of the substrate and the semiconductor element, and

the metal bump is not completely solidified at the time the semiconductor element is separated from the head section.

4. The method according to claim 1 , further comprising:

moving the head section away from the stage after the head section is heated to a desired temperature and before the heating is terminated.

5. A method of manufacturing a semiconductor device using a semiconductor device manufacturing apparatus including a stage configured to hold a substrate, a head section facing the stage and configured to hold a semiconductor element, a driving section configured to drive one of the head section and the stage to move relative to one another in a first direction intersecting the head section and the stage and apply a load to the other one of the head section and the stage, a load sensor configured to sense a load value of the applied load, and a heating portion configured to heat the head section, the method comprising:

moving one of the head section and the stage in the first direction towards the other with the driving section;

while the semiconductor element is pressed against the stage, heating the head section with the heating portion so that solder on the substrate is melted;

when the load value becomes substantially zero after the solder is melted, moving one of the head section and the stage in a second direction opposite to the first direction;

terminating the heating after a period of time to allow the head section to cool;

during the cooling of the head section, maintaining a desired distance between the stage and the head section by moving one of the head section and the stage in the first direction towards the other one of the head section and the stage with the driving section; and

separating the semiconductor element from the head section in accordance with a change in the load value.

6. The method according to claim 5 , further comprising:

after the semiconductor element is separated from the head section, moving one of the head section and the stage away from the other.

7. The method according to claim 5 , wherein

a metal bump is provided on one of the substrate and the semiconductor element and a metal electrode is provided on the other of the substrate and the semiconductor element, and

the metal bump is not completely solidified at the time the semiconductor element is separated from the head section.

8. The method according to claim 5 , further comprising:

when one of the head section and the stage is moved in the first direction towards the other with the driving section, applying the load to the other until the load value becomes a first value, and

moving the head section away from the stage with the driving section to reduce the applied load until the load value becomes a second value which is smaller than the first value, wherein

the head section is heated with the heating portion after the semiconductor element is pressed against the stage with the reduced load.

9. The method according to claim 5 , further comprising:

moving the head section away from the stage after the head section is heated to a desired temperature and before the heating is terminated.

Assignments (5)
MERGER Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: K.K. PANGEA
Reel/Frame 055659/0471 →
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 055669/0001 →
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 055669/0401 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 14, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043194/0647 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 27, 2016
From: MIURA, MASAYUKI
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 038734/0708 →
Priority Claims (1)
JP 2015-097594 · May 12, 2015 · national
Continuity (1)
Related Publication 20160336291A1 · Nov 17, 2016