Magnetic memory device and method of manufacturing the same
View Patent ↗According to one embodiment, a magnetic memory device includes a semiconductor substrate, an insulating region provided on the semiconductor substrate, an electrode plug provided in the insulating region, an amorphous conductive portion provided on the electrode plug and including a part provided in the insulating region, and a stacked structure provided on the amorphous conductive portion and including a magnetic layer.
1. A magnetic memory device comprising:
a semiconductor substrate;
an insulating region provided on the semiconductor substrate;
an electrode plug provided in the insulating region;
an amorphous conductive portion provided on the electrode plug and including a part provided in the insulating region; and
a stacked structure provided on the amorphous conductive portion and including a magnetic layer,
wherein the amorphous conductive portion is formed of an amorphous alloy of a plurality of transition metal elements.
2. The device of claim 1 , wherein at least a lower part of a side surface of the amorphous conductive portion aligns with a side surface of the electrode plug.
3. The device of claim 1 , wherein a bottom surface of the amorphous conductive portion corresponds to an upper surface of the electrode plug.
4. The device of claim 1 , wherein the stacked structure includes a first magnetic layer having a variable magnetization direction, a second magnetic layer having a fixed magnetization direction, and a nonmagnetic layer provided between the first magnetic layer and the second magnetic layer.
5. The device of claim 1 , wherein a pattern of the stacked structure is positioned inside a pattern of the amorphous conductive portion when viewed from a direction parallel to a stacked direction of the stacked structure.
6. The device of claim 1 , wherein the electrode plug is electrically connected to one of a source region or a drain region of a transistor provided in a surface region of the semiconductor substrate.
7. The device of claim 1 , wherein the stacked structure is covered with an insulating film different from an insulating film in which the electrode plug is provided.
8. A magnetic memory device comprising:
a semiconductor substrate;
an insulating region provided on the semiconductor substrate;
an electrode plug provided in the insulating region;
an amorphous conductive portion provided on the electrode plug and including a part provided in the insulating region; and
a stacked structure provided on the amorphous conductive portion and including a magnetic layer,
wherein the amorphous conductive portion is formed of a magnetic material.
9. The device of claim 8 , wherein at least a lower part of a side surface of the amorphous conductive portion aligns with a side surface of the electrode plug.
10. The device of claim 8 , wherein a bottom surface of the amorphous conductive portion corresponds to an upper surface of the electrode plug.
11. The device of claim 8 , wherein the stacked structure includes a first magnetic layer having a variable magnetization direction, a second magnetic layer having a fixed magnetization direction, and a nonmagnetic layer provided between the first magnetic layer and the second magnetic layer.
12. The device of claim 11 , wherein the amorphous conductive portion applies a magnetic field to the first magnetic layer, a direction of the magnetic field being opposite to a direction of a magnetic field applied from the second magnetic layer to the first magnetic layer.
13. The device of claim 8 , wherein a pattern of the stacked structure is positioned inside a pattern of the amorphous conductive portion when viewed from a direction parallel to a stacked direction of the stacked structure.
14. The device of claim 8 , wherein the electrode plug is electrically connected to one of a source region or a drain region of a transistor provided in a surface region of the semiconductor substrate.
15. A magnetic memory device comprising:
a semiconductor substrate;
an insulating region provided on the semiconductor substrate;
an electrode plug provided in the insulating region;
an amorphous conductive portion provided on the electrode plug and including a part provided in the insulating region; and
a stacked structure provided on the amorphous conductive portion and including a magnetic layer,
wherein the amorphous conductive portion includes plural kinds of amorphous conductive layers.
16. The device of claim 15 , wherein at least a lower part of a side surface of the amorphous conductive portion aligns with a side surface of the electrode plug.
17. The device of claim 15 , wherein a bottom surface of the amorphous conductive portion corresponds to an upper surface of the electrode plug.
18. The device of claim 15 , wherein the stacked structure includes a first magnetic layer having a variable magnetization direction, a second magnetic layer having a fixed magnetization direction, and a nonmagnetic layer provided between the first magnetic layer and the second magnetic layer.
19. The device of claim 15 , wherein a pattern of the stacked structure is positioned inside a pattern of the amorphous conductive portion when viewed from a direction parallel to a stacked direction of the stacked structure.
20. The device of claim 15 , wherein the electrode plug is electrically connected to one of a source region or a drain region of a transistor provided in a surface region of the semiconductor substrate.