Display device and method of manufacturing the same
View Patent ↗A display device and manufacturing method thereof with a high level of reliability is provided without increasing the number of manufacturing processes. The display device includes a first conductor, a first insulation layer including a first contact hole exposing a part of the first conductor, a second insulation layer including a second contact hole exposing at least a part of the first contact hole and a part of a surface of the first insulation layer, a pixel electrode overlapping a part of the second contact hole and electrically connected to the first conductor, and a third insulation layer contacting the first insulation layer via the second contact hole.
1. A display device comprising:
a first conductor;
a first insulation layer including a first contact hole exposing a part of the first conductor;
a second insulation layer including a second contact hole exposing at least a part of the first contact hole and a part of a surface of the first insulation layer;
a pixel electrode overlapping a part of the second contact hole and electrically connected to the first conductor;
a third insulation layer contacting the first insulation layer via the second contact hole; and
an EL layer including a light emitting layer overlapping the pixel electrode,
wherein an edge of the second contact hole is in the first contact hole, and
the third insulation layer is between the pixel electrode and the EL layer.
2. The display device according to claim 1 , wherein the pixel electrode is electrically connected to the first conductor via a second conductor contacting the first conductor.
3. The display device according to claim 2 , wherein the second conductor is formed from a material including at least one selected from ITO, IZO and ZnO.
4. The display device according to claim 1 , wherein the second contact hole overlaps a part of the first contact hole in a planar view.
5. The display device according to claim 1 , wherein the first insulation layer and the third insulation layer include a resin material and the second insulation layer includes an inorganic material.
6. The display device according to claim 5 , wherein the inorganic material includes silicon oxide or silicon nitride.
7. The display device according to claim 1 , wherein the first conductor is a metal layer including at least one selected from Mo, Al, W and Cr, and the pixel electrode includes a transparent conductive layer including at least one selected from ITO, IZO and ZnO.
8. The display device according to claim 1 , wherein the light emitting layer is further arranged within an aperture part exposing the pixel electrode arranged in the third insulation layer.
9. The display device according to claim 1 , wherein an edge of the pixel electrode is in the second contact hole.
10. The display device according to claim 1 , wherein the second insulation layer is arranged to extend from the inside of the first contact hole to the surface of the first insulation layer.
11. A method of manufacturing a display device comprising:
forming a first conductor;
forming a first insulation layer arranged with a first contact hole so as to expose a part of the first conductor;
forming a second insulation layer arranged with a second contact hole so as to expose at least a part of the first contact hole and a part of a surface of the first insulation layer;
forming a pixel electrode overlapping a part of the second contact hole and electrically connected to the first conductor;
forming a third insulation layer contacting the first insulation layer via the second contact hole; and
forming an EL layer including a light emitting layer overlapping the pixel electrode,
wherein an edge of the second contact hole is in the first contact hole, and
the third insulation layer is between the pixel electrode and the EL layer.
12. The method of manufacturing a display device according to claim 11 further comprising: forming a second conductor electrically connected to the first conductor so as to cover the entire first contact hole after forming the first contact hole; the pixel electrode being electrically connected to the first conductor via the second conductor.
13. The method of manufacturing a display device according to claim 12 , wherein the second conductor includes at least one selected from ITO, IZO and ZnO.
14. The method of manufacturing a display device according to claim 11 , wherein the second contact hole is formed so as to overlap a part of the first contact hole.
15. The method of manufacturing a display device according to claim 11 , wherein the first insulation layer and the third insulation layer include a resin material and the second insulation layer includes an inorganic material.
16. The method of manufacturing a display device according to claim 15 , wherein the inorganic material includes silicon oxide or silicon nitride.
17. The method of manufacturing a display device according to claim 15 , wherein the first conductor is formed as a metal layer including at least one selected from Mo, Al, W and Cr, and the pixel electrode is formed so as to include a transparent conductive layer including at least one selected from ITO, IZO and ZnO.
18. The method of manufacturing a display device according to claim 11 , wherein an aperture part exposing the pixel electrode is formed in the third insulation layer, and the light emitting layer is further formed within the aperture part.
19. The method of manufacturing a display device according to claim 11 , wherein an edge of the pixel electrode is in the second contact hole.
20. The method of manufacturing a display device according to claim 11 , wherein the second insulation layer is arranged to extend from the inside of the first contact hole to the surface of the first insulation layer.