Method for manufacturing organic EL display device, and film thickness measuring device
View Patent ↗In a method for manufacturing an organic EL display device, an underlying film is formed on each of a plurality of crystal oscillators of a film thickness measuring device. A crystal oscillator to be used for thickness measurement of the thin film is selected from the plurality of crystal oscillators with the underlying film formed thereon. The thin film is formed on the selected crystal oscillator and the substrate of the organic EL display device. A thickness of the thin film formed on the substrate of the organic EL display device is measured on the basis of a thickness of the thin film formed on the selected crystal oscillator, while forming the thin film. The crystal oscillator used for thickness measurement of the thin film is changed for another crystal oscillator on the basis of the thickness of the thin film formed on the selected crystal oscillator.
1. A film thickness measuring device comprising:
m (m is a natural number) crystal oscillators, each of the m crystal oscillators having an underlying film;
a holder to which the m crystal oscillators is attached; and
a cover for covering the m crystal oscillators attached to the holder;
wherein n (n is a natural number and not less than two and less than m) crystal oscillators in the m crystal oscillators can be exposed from the cover concurrently, and the rest of the crystal oscillators can be covered concurrently,
as the cover and the holder move relatively to each other, at least a part of the n crystal oscillators can be changed, and
the m crystal oscillators include n−1 dummy crystal oscillators.
2. The film thickness measuring device according to claim 1 , wherein
the cover covers the holder and has an opening corresponding to the n crystal oscillators, and
the cover and the holder are movable relatively to each other so that the n crystal oscillators attached to the holder are exposed through the opening.
3. The film thickness measuring device according to claim 1 , wherein
the underlying film includes a metal material.
4. The film thickness measuring device according to claim 3 , wherein
the metal material is magnesium or silver.
5. The film thickness measuring device according to claim 3 , wherein
the metal material is a silver and magnesium.
6. The film thickness measuring device according to claim 3 , wherein
the metal material is a silver-magnesium alloy.