Intense X-ray and EUV light source
View Patent ↗An intense X-ray or EUV light source may be driven by the Smith-Purcell effect. The intense light source may utilize intense electron beams and Bragg crystals. This may allow the intense light source to range from the extreme UV range up to the hard X-ray range.
1. An apparatus, comprising:
an electron beam propagating through a vacuum section of a beam pipe, wherein
the electron beam grazes over a periodic structure comprising a Bragg crystal or a crystalline lattice, producing an extreme ultraviolet (EUV) source or an X-ray source based on an energy level of the electron beam and a lattice spacing of the periodic structure.
2. The apparatus of claim 1 , wherein the lattice spacing comprises of atomic spacing within the Bragg crystal or the crystalline lattice.
3. The apparatus of claim 1 , wherein the graze of the electron beam over the periodic structure is defined by a distance between the electron beam and the periodic structure.
4. The apparatus of claim 1 , wherein a yield of a photon energy and a spectrum of the photon energy are dependent on the energy level of the electron beam and an interaction spacing.
5. The apparatus of claim 4 , wherein the interaction spacing is defined by d/λ o , where d is distance between the electron beam and the periodic structure and λ o is the lattice spacing of the periodic structure with the electron beam passing over the periodic structure.
6. The apparatus of claim 1 , wherein a yield of the photon power is dependent upon a current of the electron beam and a pulse length of the electron beam.
7. The apparatus of claim 1 , wherein a photon flux is dependent upon a density distribution of the electron beam.
8. The apparatus of claim 1 , wherein the electron beam comprises electric and magnetic fields that interact with a periodicity of the periodic structure to scatter electromagnetic radiation at an angle relative to a propagation of the electron beam.
9. The apparatus of claim 8 , wherein the scattered electromagnetic radiation is defined by
λ
s
=
λ
o
(
1
β
-
cos
θ
)
where λ o is the lattice spacing of the periodic structure with the electron beam passing over the periodic structure, β is a ratio of a velocity of the electron beam relative to speed of light, and θ is a scattering angle of the radiation.
10. The apparatus of claim 8 , wherein the scattered electromagnetic radiation is proportional to a periodicity of the periodic structure.
11. An apparatus, comprising:
a beam pipe comprising one or more vacuum sections, each of the one or more vacuum sections comprises a periodic structure having Bragg Crystals or a crystalline lattice; and
an electron beam grazes over the periodic structure in each of the one or more vacuum sections, producing an extreme ultraviolet (EUV) source or an X-ray source based on an energy level of the electron beam and a lattice spacing of the periodic structure.
12. The apparatus of claim 11 , wherein the lattice spacing for the periodic structure in each of the one or more vacuum sections comprises a varying atomic spacing.
13. The apparatus of claim 11 , wherein the lattice spacing is uniform in each of the one or more vacuum sections.
14. The apparatus of claim 11 , wherein the lattice spacing differs in each of the one or more vacuum sections.
15. The apparatus of claim 11 , wherein the energy level of the electron beam incrementally increases in between the one or more vacuum sections.
16. The apparatus of claim 11 , wherein the generated EUV source is transmitted through the beam pipe and to a substrate at an angle.
17. The apparatus of claim 16 , wherein the angle is dependent upon the energy level of the electron beam comprising gamma less than 2 and the lattice spacing of the periodic structure in each of the one or more vacuum sections.
18. The apparatus of claim 11 , wherein the generated X-ray source is transmitted through the beam pipe and to a test section at an angle.
19. The apparatus of claim 16 , wherein the angle is dependent upon the energy level of the electron beam comprising gamma greater than 2 and the lattice spacing of the periodic structure in each of the one or more vacuum sections.
20. An apparatus, comprising:
a plurality of vacuum sections, each of the plurality of vacuum sections comprises a periodic structure; and
an electron beam traversing over the periodic structure in each of the plurality of vacuum structures to produce an extreme ultraviolet (EUV) source when an energy level of the electron beam comprises gamma less than 2 or produce an X-ray source when the energy level of the electron beam comprises gamma greater than 2.