Thermocompression bonding approaches for foil-based metallization of non-metal surfaces of solar cells
Thermocompression bonding approaches for foil-based metallization of non-metal surfaces of solar cells, and the resulting solar cells, are described. For example, a solar cell includes a substrate and a plurality of alternating N-type and P-type semiconductor regions disposed in or above the substrate. A plurality of conductive contact structures is electrically connected to the plurality of alternating N-type and P-type semiconductor regions. Each conductive contact structure includes a metal foil portion disposed in direct contact with a corresponding one of the alternating N-type and P-type semiconductor regions.
1. A solar cell, comprising:
a substrate;
a plurality of alternating N-type and P-type semiconductor regions disposed above the substrate;
an anti-reflective coating layer disposed over the plurality of alternating N-type and P-type semiconductor regions;
a plurality of conductive contact structures over the plurality of alternating N-type and P-type semiconductor regions and over the anti-reflective coating layer, the plurality of conductive contact structures electrically connected to the plurality of alternating N-type and P-type semiconductor regions, each conductive contact structure comprising a metal foil portion, wherein the metal foil portion is an aluminum foil including aluminum and a texturized surface comprising a texture, wherein the texture of the metal foil portion is facing toward a corresponding one of the alternating N-type and P-type semiconductor regions, the texture having a nonplanar topography that provides a plurality of valleys between the plurality of conductive contact structures and the anti-reflective coating layer; and
a metal flow region between the plurality of conductive contact structures and the anti-reflective coating layer, wherein the metal flow region fills in and at least partially closes ones of the plurality of valleys.
2. The solar cell of claim 1 , wherein the plurality of alternating N-type and P-type semiconductor regions is a plurality of alternating N-type and P-type polycrystalline silicon regions disposed above the substrate.
3. The solar cell of claim 1 , wherein portions of the anti-reflective coating layer are in direct contact with regions of the metal foil portions of the conductive contact structures.
4. The solar cell of claim 3 , wherein the anti-reflective coating layer comprises a silicon-rich silicon nitride layer.
5. A solar cell, comprising:
a substrate;
a plurality of alternating N-type and P-type semiconductor regions disposed above the substrate;
an anti-reflective coating layer disposed over the plurality of alternating N-type and P-type semiconductor regions;
a plurality of conductive contact structures over the plurality of alternating N-type and P-type semiconductor regions and over the anti-reflective coating layer, the plurality of conductive contact structures electrically connected to the plurality of alternating N-type and P-type semiconductor regions, each conductive contact structure comprising a metal foil portion disposed above and in alignment with a corresponding one of the alternating N-type and P-type semiconductor regions, wherein the metal foil portion includes aluminum and has a texturized surface comprising a texture, and wherein the texture of the metal foil portion is facing toward the corresponding one of the alternating N-type and P-type semiconductor regions, the texture having a non-planar topography that provides a plurality of valleys between the plurality of conductive contact structures and the anti-reflective coating layer; and
a metal flow region between the plurality of conductive contact structures and the anti-reflective coating layer, wherein the metal flow region fills in and at least partially closes ones of the plurality of valleys.
6. The solar cell of claim 5 , wherein the plurality of alternating N-type and P-type semiconductor regions is a plurality of alternating N-type and P-type polycrystalline silicon regions disposed above the substrate.
7. The solar cell of claim 5 , wherein portions of the anti-reflective coating layer are in direct contact with regions of the metal foil portions of the conductive contact structures.
8. The solar cell of claim 7 , wherein the anti-reflective coating layer comprises a silicon-rich silicon nitride layer.
9. The solar cell of claim 1 , wherein the texturized surface comprises a brushed foil texture in two directions.
10. The solar cell of claim 1 , wherein the texturized surface comprises embossed portions.
11. The solar cell of claim 1 , wherein the texturized surface comprises a surface oxide.
12. The solar cell of claim 5 , wherein the texturized surface comprises a brushed foil texture in two directions.
13. The solar cell of claim 5 , wherein the texturized surface comprises embossed portions.
14. The solar cell of claim 5 , wherein the texturized surface comprises a surface oxide.