METHOD AND APPARATUS FOR OXIDATION OF TWO-DIMENSIONAL MATERIALS

1 - 20 . (canceled)

21 . A method, comprising:

providing a two-dimensional object comprising a III-V group material and/or a Transition Metal Dichalcogenides (TMD) group material into an environment comprising oxygen; and

exposing at least one part of the two-dimensional object to photonic irradiation in said environment, thereby oxidizing at least part of the material of the exposed part of the two-dimensional object.

22 . The method of claim 21 , further comprising:

providing a substrate, and

prior to providing the two-dimensional object into an environment comprising oxygen, depositing the III-V group material and/or the TMD group material onto the substrate, thereby forming the two-dimensional object comprising the III-V group material and/or the Transition Metal Dichalcogenides (TMD) group material.

23 . The method of claim 22 , wherein depositing the III-V group material and/or the TMD group material onto the substrate is performed by at least one of the following techniques: spray coating, spin-coating, drop-coating, thin film transfer and inkjet printing.

24 . The method of claim 22 , wherein the substrate comprises a plastic substrate.

25 . The method of claim 22 , wherein the substrate comprises a rigid glass substrate.

26 . The method of claim 21 , wherein the III-V group material comprises at least one of: Boron nitride (BN), Boron carbon nitride (BCN), Aluminium nitride (AlN), Gallium nitride (GaN), Indium Nitride (InN), Indium phosphide (InP), Indium arsenide (InAs), Boron phosphide (BP), Boron arsenide (BAs), and Gallium phosphide (GaP).

27 . The method of claim 21 , wherein the TMD group material comprises at least one of: Molybdenum sulfide (MoS 2 ), Molybdenum diselenide (MoSe 2 ), Tungsten sulfide (WS 2 ), Tungsten diselenide (WSe 2 ), Niobium sulfide (NbS 2 ), Vanadium sulfide (VS 2, ), and Tantalum sulfide (TaS 2 ).

28 . The method of claim 21 , wherein the photonic irradiation comprises a wavelength spectrum between 200 nanometers to 900 nanometers by a xenon flash lamp.

29 . The method of claim 21 , wherein exposing at least one part of the two-dimensional object to photonic irradiation comprises exposing the at least one part of the two-dimensional object to pulsed photonic irradiation.

30 . The method of claim 29 , wherein an individual pulse duration of the pulsed photonic irradiation is between 10 microseconds and 5 milliseconds, with a pulse frequency between 1 Hertz and 300 Hertz.

31 . The method of claim 21 , wherein exposing at least one part of the two-dimensional object to photonic irradiation is performed for a period of time between 1 second and 60 minutes.

32 . The method of claim 21 , wherein exposing at least one part of the two-dimensional object to photonic irradiation comprises exposing the at least one part of the two-dimensional object to photonic irradiation using a photomask.

33 . The method of claim 32 , wherein exposing at least one part of the two-dimensional object to photonic irradiation using a photomask comprises selectively exposing to photonic irradiation at least one part of the two-dimensional object that is not covered by the photomask, thereby oxidizing at least part of the material of the two-dimensional object not covered by the photomask.

34 . The method of claim 22 , wherein exposing at least one part of the two-dimensional object to photonic irradiation comprises exposing the at least one part of the two-dimensional object to photonic irradiation from a source that is positioned, at a predetermined distance, on the side of the substrate on which the III-V group material and/or the TMD group material was deposited.

35 . A device comprising:

a reactor and

a flash lamp, wherein the reactor comprises an environment comprising oxygen, and wherein the device further comprises:

a space at least partially inside the environment for receiving a two-dimensional object comprising a III-V group material and/or a Transition Metal Dichalcogenides (TMD) group material,

wherein the flash lamp is caused to irradiate at least one part of the two-dimensional object when the two-dimensional object is in the space, thus causing oxidation of at least part of the material in the irradiated part of the two-dimensional object.

36 . The device of claim 35 , further comprising a reflector for directing the photonic irradiation of the flash lamp toward the two-dimensional object.

37 . The device of claim 35 , further comprising a discharge module for providing electrical power to the flash lamp at a predetermined frequency and duration.

38 . The device of claim 35 , wherein the flash lamp is a xenon flash lamp with an emission spectrum between 200 nanometers and 900 nanometers, and wherein the flash lamp is caused to irradiate at least one part of the two-dimensional object in pulses.

39 . The device of claim 38 , wherein individual pulse duration is between 10 microseconds and 5 milliseconds and a pulse frequency is between 1 Hertz and 300 Hertz.

40 . An apparatus comprising

at least one processor;

at least one memory coupled to the at least one processor, the at least one memory comprising program code instructions which, when executed by the at least one processor, cause the apparatus to:

provide a two-dimensional object comprising a III-V group material and/or a Transition Metal Dichalcogenides (TMD) group material into an environment comprising oxygen; and

expose at least one part of the two-dimensional object to photonic irradiation in said environment, thereby oxidizing at least part of the material of the exposed part of the two-dimensional object.