Nitride semiconductor light emitting element
View Patent ↗A nitride semiconductor light emitting element 1 includes a second conductivity type nitride semiconductor layer which is formed above a first conductivity type nitride semiconductor layer, a first electrode 17 a which is formed on a first region of the second conductivity type nitride semiconductor layer with a first current non-injection layer 13 a in between, a first current diffusing layer 14 a which is formed between the first current non-injection layer 13 a and the first electrode 17 a , a second electrode 17 b which is formed on a second region of the second conductivity type nitride semiconductor layer with a second current non-injection layer 13 b in between, a second current diffusing layer 14 b which is formed on the second region and on the second current non-injection layer 13 b , and an extending portion 17 c which extends from the first electrode 17 a and reaches the exposed first conductivity type nitride semiconductor layer.
1. A nitride semiconductor light emitting element having an n-side electrode and a p-side electrode disposed on a light extraction side so that the nitride semiconductor light emitting element is mounted face-up, comprising:
a substrate;
a first conductivity type nitride semiconductor layer that is formed on the substrate;
an active layer that is formed on the first conductivity type nitride semiconductor layer;
a second conductivity type nitride semiconductor layer that is formed on the active layer;
an exposed portion on the first conductivity type nitride semiconductor layer that is exposed by removing a part of the second conductivity type nitride semiconductor layer and the active layer;
a first current non-injection layer that is formed on a region on the second conductivity type nitride semiconductor layer;
a first current diffusing layer that is formed on the first current non-injection layer;
a second current diffusing layer that is formed on another region on the second conductivity type nitride semiconductor layer;
a first electrode that is formed on the first current diffusing layer;
a second electrode that is formed on the second current diffusing layer; and
an extending portion of the first electrode that extends from the first electrode and is formed to reach a part of the exposed portion on the first conductivity type nitride semiconductor layer, wherein
the second current diffusing layer is not formed under the first electrode.
2. The nitride semiconductor light emitting element according to claim 1 , further comprising:
a second current non-injection layer that is formed between the other region of the second conductivity type nitride semiconductor layer and the second current diffusing layer.
3. The nitride semiconductor light emitting element according to claim 1 , further comprising:
an extending portion of the second electrode which extends from the second electrode and is formed on the second conductivity type nitride semiconductor layer.
4. The nitride semiconductor light emitting element according to claim 1 ,
wherein the first current non-injection layer is formed on a region on the second conductivity type nitride semiconductor layer, and on a region of the exposed portion on the first conductivity type nitride semiconductor layer.
5. The nitride semiconductor light emitting element according to claim 1 ,
wherein the first current diffusing layer is formed on only a region of the second conductivity type nitride semiconductor layer.
6. The nitride semiconductor light emitting element according to claim 1 ,
wherein the first current diffusing layer is formed below the first electrode and the extending portion of the first electrode.
7. The nitride semiconductor light emitting element according to claim 6 ,
wherein, the first current diffusing layer is separately formed below the first electrode and below the extending portion of the first electrode in a stepped portion which is formed from an upper surface of the second conductivity type nitride semiconductor layer to reach the exposed portion on the first conductivity type nitride semiconductor layer.
8. A method of manufacturing the nitride semiconductor light emitting element according to claim 1 , the method comprising:
simultaneously forming the first current diffusing layer and the second current diffusing layer.
9. A method of manufacturing the nitride semiconductor light emitting element according to claim 2 , the method comprising:
simultaneously forming the first current non-injection layer and the second current non-injection layer.