Photovoltaic structures with interlocking busbars

1. A photovoltaic structure, comprising:

a first metallic grid positioned on a first surface of the photovoltaic structure, wherein the first metallic grid includes a first set of discontinuous segments positioned near an edge of the photovoltaic structure; and

a second metallic grid positioned on a second surface of the photovoltaic structure, wherein the second metallic grid includes a second set of discontinuous segments positioned near an opposite edge of the photovoltaic structure;

wherein the first and the second sets of discontinuous segments have substantially complementary topology profiles such that, when the edge of the photovoltaic structure overlaps with an opposite edge of an adjacent photovoltaic structure with a same metallic-grid configuration, a respective segment on the first surface of the photovoltaic structure fits in a corresponding gap between two neighboring segments on the second surface of the adjacent photovoltaic structure, thereby facilitating interlocking of the segments between the two photovoltaic structures wherein, within each of the first and second metallic grids, the discontinuous segments are not directly coupled to one another by a metallic material except by segments of another grid when two photovoltaic structures are overlapped.

2. The photovoltaic structure of claim 1 , wherein the discontinuous segments within a respective set have substantially the same length.

3. The photovoltaic structure of claim 1 , wherein the first metallic grid and the second metallic grid each include a plurality of finger lines.

4. The photovoltaic structure of claim 1 , wherein the first metallic grid and the second metallic grid each include an electroplated Cu layer.

5. The photovoltaic structure of claim 1 , further comprising a layer of conductive paste, wherein the conductive paste is configured to bond the respective segment on the first surface of the photovoltaic structure to a portion of the second surface of the adjacent photovoltaic structure.

6. A photovoltaic structure, comprising:

a multilayer photovoltaic body;

a first metallic grid positioned on a first surface of the photovoltaic body, wherein the first metallic grid includes a first set of discontinuous segments positioned near an edge of the photovoltaic structure; and

a second metallic grid positioned on a second surface of the photovoltaic body, wherein the second metallic grid includes a second set of discontinuous segments positioned near an opposite edge of the photovoltaic structure;

wherein the first and the second sets of discontinuous segments have substantially complementary topology profiles such that, when the edge of the photovoltaic structure overlaps with an opposite edge of an adjacent photovoltaic structure with a same metallic-grid configuration, a respective segment on the first surface of the photovoltaic structure fits in a corresponding gap between two neighboring segments on the second surface of the adjacent photovoltaic structure, thereby facilitating interlocking of the segments between the two photovoltaic structures wherein, within each of the first and second metallic grids, the discontinuous segments are not directly coupled to one another by a metallic material except by segments of another grid when two photovoltaic structures are overlapped.

7. The photovoltaic structure of claim 6 , wherein the discontinuous segments within a respective set have substantially the same length.

8. The photovoltaic structure of claim 6 , wherein the first metallic grid and the second metallic grid each include a plurality of finger lines.

9. The photovoltaic structure of claim 6 , wherein the first metallic grid and the second metallic grid each include an electroplated Cu layer.

10. The photovoltaic structure of claim 6 , further comprising a layer of conductive paste, wherein the conductive paste is configured to bond the respective segment on the first surface of the photovoltaic structure to a portion of the second surface of the adjacent photovoltaic structure.

11. The photovoltaic structure of claim 6 , wherein the multilayer photovoltaic body comprises:

a base layer;

a first quantum tunneling barrier layer positioned on a first surface of the base layer;

a second quantum tunneling barrier layer positioned on a second surface of the base layer;

an emitter layer positioned on the first quantum tunneling barrier layer;

a surface field layer positioned on the second quantum tunneling barrier layer;

a first transparent conductive oxide layer positioned on the emitter layer; and

a second transparent conductive oxide layer positioned on surface field layer.

12. A method for fabricating a photovoltaic structure, comprising:

obtaining a multilayer photovoltaic body;

forming a first metallic grid on a first surface of the photovoltaic body, wherein the first metallic grid includes a first set of discontinuous segments positioned near an edge of the photovoltaic structure; and

forming a second metallic grid on a second surface of the photovoltaic body, wherein the second metallic grid includes a second set of discontinuous segments positioned near an opposite edge of the photovoltaic structure;

wherein the first and the second sets of discontinuous segments have substantially complementary topology profiles such that, when the edge of the photovoltaic structure overlaps with an opposite edge of an adjacent photovoltaic structure with a same metallic-grid configuration, a respective segment on the first surface of the photovoltaic structure fits in a corresponding gap between two neighboring segments on the second surface of the adjacent photovoltaic structure, thereby facilitating interlocking of the segments between the two photovoltaic structures wherein, within each of the first and second metallic grids, the discontinuous segments are not directly coupled to one another by a metallic material except by segments of another grid when two photovoltaic structures are overlapped.

13. The method of claim 12 , wherein forming the first and second metallic grids involves electroplating a Cu layer on the first and second surfaces of the photovoltaic structure.

14. The method of claim 13 , wherein electroplating the Cu layer involves forming a plating mask by direct laser writing on a wax layer.