Semiconductor lens optimization of fabrication
Embodiments comprise a system created through fabricating a lens array through which lasers are emitted. The lens array may be fabricated in the semiconductor substrate used for fabricating the lasers or may be a separate substrate of other transparent material that would be aligned to the lasers. In some embodiments, more lenses may be produced than will eventually be used by the lasers. The inner portion of the substrate may be formed with the lenses that will be used for emitting lasers, and the outer portion of the substrate may be formed with lenses that will not be used for emitting lasers—rather, through etching these additional lenses, the inner lenses may be created with a higher quality.
1. A method for manufacturing lenses, the method comprising:
etching a layer of photoresist over a substrate to form a lens array with a plurality of lenses, wherein the lens array further comprises an inner portion with a first set of lenses and an outer portion with a second set of lenses, wherein the second set of lenses is positioned adjacent to and surrounds the first set of lenses, wherein each lens in the first set of lenses is surrounded by a same number of lenses of either the first set of lenses or the second set of lenses; and
positioning each laser among a plurality of lasers to correspond with each lens in the first set of lenses and positioning no laser to correspond with any of the lenses in the second set of lenses.
2. The method of claim 1 , wherein etching the layer of photoresist is accomplished by at least one of: a wet etching process, an anisotropic wet etching process, a plasma etching process, and a dry etching process.
3. The method of claim 2 , wherein etching a layer includes transferring a pattern for the lens array from photoresist into the substrate.
4. The method of claim 1 , wherein the lens array is circular in configuration.
5. The method of claim 1 , wherein the plurality of lasers are positioned on the opposite side of the substrate from the lens array and wherein each laser is configured to emit light into each lens in the first set of lenses.
6. The method of claim 5 , wherein a first laser is aligned to the center of a first lens from the first set of lenses and a second laser is aligned to be off-center of a second lens from the first set of lenses.
7. The method of claim 1 , wherein the substrate is deposited with a thick material to serve as a protective height barrier and prevent scratches.
8. The method of claim 1 , wherein each lens of the first set of lenses comprises a substantially similar Radius of Curvatures (ROCs) and wherein each lens of the first set of lenses is configured to be a length of several lenses from a border of the substrate.
9. The method of claim 1 , wherein a distance from a center of any lens among the first set of lenses or the second set of lenses and the center of any adjacent lens is the same.
10. The method of claim 1 , wherein a first lens in the second set of lenses comprises a smaller pitch than a second lens in the second set of lenses.
11. A method for manufacturing lenses, the method comprising:
forming a lens array with a plurality of lenses, wherein the lens array further comprises an inner portion with a first set of lenses and an outer portion with a second set of lenses, wherein the second set of lenses is positioned adjacent and surrounds the first set of lenses, wherein each lens in the first set of lenses is surrounded by a same number of lenses of either the first set of lenses or the second set of lenses; and
positioning each laser among a plurality of lasers to correspond with each lens in the first set of lenses and positioning no laser to correspond with any of the lenses in the second set of lenses.
12. The method of claim 11 , wherein forming the lens array is accomplished by greyscale photolithography.
13. The system of claim 11 , wherein forming the lens array comprises transferring a pattern of lens shapes to the substrate.
14. The system of claim 13 , wherein transferring the pattern of lens shapes includes etching a layer of photoresist and the substrate.
15. The method of claim 14 , wherein etching a layer of photoresist includes at least one of: a wet etching process, an anisotropic wet etching process, a plasma etching process, and a dry etching process.
16. The method of claim 11 , wherein the lens array is circular in configuration.
17. The method of claim 11 , wherein the plurality of lasers are positioned on the opposite side of the substrate from the lens array and each laser is configured to emit light into each lens in the first set of lenses.
18. The method of claim 17 , wherein a first laser is aligned to the center of a first lens from the first set of lenses and a second laser is aligned to be off-center of a second lens from the first set of lenses.
19. The method of claim 11 , wherein the substrate is deposited with a thick material to serve as a protective height barrier and prevent scratches.
20. The method of claim 11 , wherein each lens of the first set of lenses comprises substantially similar Radius of Curvatures (ROCs) and wherein each lens of the first set of lenses are configured to be a length of several lenses from a border of the substrate.
21. The method of claim 11 , wherein a distance from a center of any lens among the first set of lenses or the second set of lenses and the center of any adjacent lens is the same.
22. The method of claim 11 , wherein a first lens in the second set of lenses comprises a smaller pitch than a second lens in the second set of lenses.