Method for Cleaning Hermetic Semiconductor Packages
A method for removing undesirable particles from a semiconductor package is disclosed. The method comprises dispensing dry ice into random cavities of the semiconductor package, and removing the undesirable particles from the random cavities using the dry ice, where the dry ice causes the undesirable particles to dislodge from the random cavities, and where the undesirable particles are removed through an exhaust system. The method further comprises placing the semiconductor package into a vacuum, dispensing nitrogen into the random cavities, and hermetically sealing the semiconductor package so as to produce a hermetic semiconductor package. At least one of the random cavities is on a surface of a semiconductor die in the semiconductor package.
1 . A method for removing undesirable particles from a semiconductor package, said method comprising:
dispensing dry ice into random cavities of said semiconductor package;
removing said undesirable particles from said random cavities using said dry ice.
2 . The method of claim 1 , further comprising hermetically sealing said semiconductor package so as to produce a hermetic semiconductor package.
3 . The method of claim 1 , wherein said dry ice causes said undesirable particles to dislodge from said random cavities.
4 . The method of claim 1 , further comprising dispensing nitrogen into said random cavities.
5 . The method of claim 1 , further comprising placing said semiconductor package into a vacuum.
6 . The method of claim 1 , where at least one of said undesirable particles has a diameter approximately equal to or less than 25 microns.
7 . The method of claim 1 , wherein said undesirable particles are removed through an exhaust system.
8 . The method of claim 1 , wherein said dry ice sublimates into gas without leaving residues in said semiconductor package.
9 . The method of claim 1 , wherein at least one of said random cavities is on a surface of a semiconductor die in said semiconductor package.
10 . The method of claim 9 , wherein said semiconductor die comprises a group IV material.
11 . The method of claim 9 , wherein said semiconductor die comprises a group III-V material.
12 . A method for cleaning a semiconductor package, said method comprising:
dispensing dry ice and nitrogen concurrently into random cavities of said semiconductor package;
removing said undesirable particles from said random cavities using said dry ice;
hermetically sealing said semiconductor package.
13 . The method of claim 12 , wherein said dry ice causes said undesirable particles to dislodge from said random cavities.
14 . The method of claim 12 , further comprising placing said semiconductor package into a vacuum.
15 . The method of claim 12 , where at least one of said undesirable particles has a diameter approximately equal to or less than 25 microns.
16 . The method of claim 12 , wherein said undesirable particles are removed through an exhaust system.
17 . The method of claim 12 , wherein said dry ice sublimates into gas without leaving residues in said semiconductor package.
18 . The method of claim 12 , wherein at least one of said random cavities is on a surface of a semiconductor die in said semiconductor package.
19 . The method of claim 18 , wherein said semiconductor die comprises a group IV material.
20 . The method of claim 18 , wherein said semiconductor die comprises a group III-V material.