Semiconductor device
A semiconductor device includes a first insulating film, a first wiring, a second insulating film, and a second wiring. The first insulating film is formed on a semiconductor substrate. The first wiring is formed on the first insulating film. The second insulating film is provided on the first insulating film to cover the first wiring. The second wiring is formed on the second insulating film. Furthermore, the second insulating film has a first opening part and a second opening part which expose the first wiring. The second wiring has a seed layer and a first plating layer. The first plating layer covers an entire side surface of the seed layer. The seed layer is not provided in the second opening part and a periphery thereof.
1. A semiconductor device comprising:
a first insulating film formed on a semiconductor substrate;
a first wiring formed on the first insulating film;
a second insulating film provided on the first insulating film to cover the first wiring; and
a second wiring formed on the second insulating film, wherein:
the second insulating film has a first opening part and a second opening part which expose the first wiring,
the second wiring has a seed layer provided in the first opening part and in a periphery of the first opening part, and a first plating layer provided on the seed layer,
the first plating layer covers an upper surface and a side surface of the seed layer,
a lower surface of the first plating layer is in direct contact with an upper surface of the second insulating film in entire circumference outside the seed layer, and
the seed layer is not provided in the second opening part and in a periphery of the second opening part.
2. The semiconductor device according to claim 1 , wherein the seed layer is made of a first metal and
the first plating layer is made of a second metal whose hardness is higher than hardness of the first metal.
3. The semiconductor device according to claim 2 , wherein the first metal is copper, and the second metal is nickel.
4. The semiconductor device according to claim 1 , further comprising a second plating layer provided between the seed layer and the first plating layer,
wherein the first plating layer covers an upper surface and an entire side surface of the second plating layer.
5. The semiconductor device according to claim 4 , wherein the second plating layer is a base layer of the second wiring.
6. The semiconductor device according to claim 4 , wherein a plurality of the first opening parts are provided,
the second plating layer has a plurality of portions each provided corresponding to a different one of the plurality of the first opening parts and separated from each other, and
the first plating layer integrally covers the plurality of portions of the second plating layer.
7. The semiconductor device according to claim 6 , wherein the plurality of portions of the second plating layer are arranged in one row.
8. The semiconductor device according to claim 6 , wherein the plurality of portions of the second plating layer are arranged in a matrix form.
9. The semiconductor device according to claim 1 , wherein the first plating layer is a base layer of the second wiring.
10. The semiconductor device according to claim 9 , wherein a plurality of the first opening parts are provided.
11. The semiconductor device according to claim 1 , wherein the first opening part has a planar rectangular shape.
12. The semiconductor device according to claim 1 , further comprising a third wiring provided on the first insulating film and adjacent to the first wiring,
wherein the second wiring is formed across the first wiring and the third wiring.
13. The semiconductor device according to claim 1 , wherein the second wiring has a third plating layer provided on the first plating layer.
14. The semiconductor device according to claim 1 , wherein the first wring has a recess part in a portion exposed through the second opening part.
15. The semiconductor device according to claim 1 , wherein the second wiring is a bump pad.
16. The semiconductor device according to claim 1 , further comprising a barrier layer between the seed layer and the first wiring in the first opening part.
17. The semiconductor device according to claim 16 , wherein a position of a side edge of the seed layer coincides with a position of a side edge of the barrier layer.