Debris removal in high aspect structures
View Patent ↗A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.
1. A nano-scale metrology system, comprising:
a scanning probe microscopy (SPM) tip;
an irradiation source configured and arranged to direct an incident irradiation onto the SPM tip;
an irradiation detector configured and arranged to receive a sample irradiation from the SPM tip, the sample irradiation being caused by the incident irradiation;
an actuator system operatively coupled to the nano-scale metrology system and configured to effect relative motion between the SPM tip and at least one of the irradiation source and the irradiation detector;
the actuator system further configured to effect relative motion between a collector and at least one of the irradiation source and the irradiation detector;
the actuator system further configured to move the SPM tip relative to the collector for transfer of at least one particle or debris from a substrate to the SPM tip and from the SPM tip to the collector; and
a controller operatively coupled to the actuator system and the irradiation detector, the controller being configured to
move the SPM tip from a location proximate to the substrate to a metrology location to receive a first signal from the irradiation detector,
receive the first signal based on a first response of the irradiation detector to the sample irradiation, and
effect relative motion between the SPM tip and at least one of the irradiation detector and the irradiation source via the actuator system based on the first signal.
2. The nano-scale metrology system of claim 1 , wherein the actuator system is operatively coupled to the SPM tip, and the actuator system includes a rotary actuator configured to rotate the SPM tip about a first axis.
3. The nano-scale metrology system of claim 1 , wherein the irradiation source is an x-ray source.
4. The nano-scale metrology system of claim 1 , wherein the irradiation source is a laser.
5. The nano-scale metrology system of claim 1 , wherein the irradiation source is an electron beam.
6. The nano-scale metrology system of claim 1 , wherein the controller is further configured to generate a first frequency domain spectrum of the sample irradiation based on the first signal,
generate a second frequency domain spectrum by subtracting a background frequency domain spectrum from the first frequency domain spectrum, and
effect relative motion between the SPM tip and at least one of the irradiation detector and the irradiation source via the actuator system based on the second frequency domain spectrum.
7. The nano-scale metrology system of claim 6 , wherein the controller is further configured to generate the background frequency domain spectrum based on a response of the irradiation detector to irradiation of the SPM tip when the SPM tip is substantially free from contamination.
8. The nano-scale metrology system of claim 1 , wherein the controller is further configured to receive a second signal based on a second response of the irradiation detector to the sample irradiation, and
effect relative motion between the SPM tip and at least one of the irradiation detector and the irradiation source via the actuator system based on a difference between the first signal and the second signal.