IP Library Granted Patent US 9,748,434
Granted Patent B1
US 9,748,434 · App. 15/163,543 · Granted Aug 29, 2017

Systems, method and apparatus for curing conductive paste

Inventors: Edward Sung (Milpitas, CA); James Zu-Yi Liu (Fremont, CA)
Assignee: Tesla, Inc.
H01L31/1864H01L25/50H01L31/0512
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 9,748,434
App. No.
15/163,543
Granted
Aug 29, 2017
Kind
B1
Abstract

One embodiment can provide a system for curing conductive paste applied on photovoltaic structures. The system can include a wafer carrier for carrying a plurality of photovoltaic structures and a heater. The wafer carrier can include a surface element that is in direct contact with the photovoltaic structures and is substantially thermally insulating. The heater can be positioned above the wafer carrier. The heater can include a heated radiation surface that does not directly contact the photovoltaic structures.

Claims (10)

1. A method for curing conductive paste applied to two adjacent photovoltaic structures, the method comprising:

placing the two adjacent photovoltaic structures on a wafer carrier, wherein the two photovoltaic structures are coupled in a cascaded manner by a conductive paste, where two adjacent edges of the two photovoltaic structures overlap, wherein the wafer carrier includes a surface element that is in direct contact with the photovoltaic structures and is substantially thermally insulating, and wherein the wafer carrier is placed on a conveyor; and

controlling movement of the conveyor to position the wafer carrier to a vicinity of a heating block such that a heated radiation surface of the heating block radiates heat to the photovoltaic structures for a predetermined duration to cure the conductive paste.

2. The method of claim 1 , wherein the surface element of the wafer carrier is made of polybenzimidazole (PBI) plastic.

3. The method of claim 1 , wherein the surface element includes a number of components separated by air gaps to allow an individual component to expand when heated.

4. The method of claim 1 , wherein the heated radiation surface is maintained at a predetermined temperature between 200 and 600° C., and wherein the predetermined duration is between 25 and 60 seconds.

5. The method of claim 1 , wherein the heated radiation surface of the heating block is coated with a substantially dark colored coating.

6. The method of claim 5 , wherein the substantially dark colored coating includes an anodizing coating or a high-emissivity coating, and wherein a thickness of the dark colored coating is between 1 and 100 microns.

7. The method of claim 5 , wherein other surfaces of the heating block are polished or covered with a layer of thermal insulation material.

8. The method of claim 1 , wherein the heating block is made of a material having a thermal conductivity of at least 50 W/(m·k).

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 6, 2021
From: SOLARCITY CORPORATION
To: TESLA, INC.
Reel/Frame 056172/0062 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 26, 2016
From: SUNG, EDWARD; ZU-YI LIU, JAMES
To: SOLARCITY CORPORATION
Reel/Frame 038725/0855 →