Leveler, leveler composition and method for electrodeposition of metals in microelectronics
The present disclosure relates to a leveling compound for electrodepositing metals. The compound is of formula (I) or a salt thereof:
1. A compound of formula (I), or a salt thereof:
wherein R 1 is O, S or N;
R 2 is selected from the group consisting of unsubstituted or substituted alkyl, unsubstituted or substituted alkoxyl, unsubstituted or substituted alkenyl, unsubstituted or substituted alkynyl, unsubstituted or substituted alkylhydroxyl, unsubstituted or substituted C 3-12 cycloalkyl, unsubstituted or substituted 3-12 membered heterocyclic, and unsubstituted or substituted 5-12 membered heteroaryl;
R 3 and R 4 are independently selected from the group consisting of hydrogen, unsubstituted or substituted alkyl, unsubstituted or substituted alkoxyl, unsubstituted or substituted alkenyl, unsubstituted or substituted alkynyl, unsubstituted or substituted alkylhydroxyl, unsubstituted or substituted C 3-12 cycloalkyl, unsubstituted or substituted C 6-12 aryl, unsubstituted or substituted 3-12 membered heterocyclic, and unsubstituted or substituted 5-12 membered heteroaryl;
Y 1 , Y 2 ,Y 3 , Y 4 , Y 5 , Y 6 , Y 7 , and Y 8 are independently selected from the group consisting of hydrogen, halogen, unsubstituted or substituted alkyl, unsubstituted or substituted alkoxyl, unsubstituted or substituted alkenyl, unsubstituted or substituted alkynyl, unsubstituted or substituted C 3-12 cycloalkyl, unsubstituted or substituted C 6-12 aryl, unsubstituted or substituted 3-12 membered heterocyclic, and unsubstituted or substituted 5-12 membered heteroaryl; and
L is selected from the group consisting of −(CH 2 ) m — and wherein m is an integer, unsubstituted or substituted C 6-12 aryl, and unsubstituted or substituted 3- to 12-membered heterocyclyl.
2. The compound of claim 1 , wherein R 1 is O.
3. The compound of claim 1 , wherein Y 1 , Y 2 , Y 3 , Y 4 , Y 5 , Y 6 , Y 7 , and Y 8 are hydrogen.
4. The compound of claim 1 , wherein at least one of Y 1 , Y 2 , Y 3 , Y 4 , Y 5 , Y 6 , Y 7 , and Y 8 is alkoxyl.
5. The compound of claim 1 , wherein R 2 , R 3 and R 4 are each independently C 1-6 alkyl.
6. The compound of claim 1 , wherein R 2 is alkoxyl.
7. The compound of claim 1 , wherein R 2 is ethoxyl.
8. The compound of claim 1 , wherein m is one or two.
9. The compound of claim 1 has a structure selected from the group consisting of: