Substrate processing apparatus and substrate processing method
According to one embodiment, a substrate processing apparatus includes a nozzle and a control device. The nozzle dispenses a chemical solution onto a substrate. The control device controls a mechanism which promotes evaporation of a solvent contained in the chemical solution remaining in the nozzle to form a solidified layer in the nozzle. The solidified layer is obtained by solidifying components contained in the remaining chemical solution.
1. A substrate processing apparatus comprising:
a nozzle to dispense a chemical solution onto a substrate;
a control device that controls a mechanism which promotes evaporation of a solvent contained in the chemical solution remaining in the nozzle, thereby solidifying components contained in the remaining chemical solution to form a solidified layer in the nozzle; and
a container placed at a position in which the nozzle is made to wait and into which a tip of the nozzle is inserted, wherein
the mechanism includes a heater that supplies heat to the nozzle in the position in which the nozzle is made to wait,
the heater is provided in the container, and
the control device controls operation of the heater.
2. The substrate processing apparatus according to claim 1 , wherein the control device makes the heater stop operating when a preset time has elapsed since the heater started operating.
3. The substrate processing apparatus according to claim 1 , wherein the control device controls dispensing the chemical solution through the nozzle and detaches the solidified layer from the nozzle in the position in which the nozzle is made to wait, by preliminary dispensing of the chemical solution.
4. The substrate processing apparatus according to claim 3 , wherein the control device controls the nozzle to move and, after the preliminary dispensing, moves the nozzle to a position over the substrate.
5. The substrate processing apparatus according to claim 3 ,
wherein the control device makes the heater operate before the preliminary dispensing.
6. The substrate processing apparatus according to claim 5 , wherein the control device controls the nozzle to move and, before the heater is made to operate before the preliminary dispensing, moves the nozzle.
7. The substrate processing apparatus according to claim 6 , wherein the control device makes the heater stop operating when a preset time has elapsed since the heater started operating, and
the control device controls the nozzle to move and, after the preliminary dispensing, moves the nozzle to a position over the substrate.
8. The substrate processing apparatus according to claim 1 , wherein the mechanism includes a pump that generates air current around the nozzle in the position in which the nozzle is made to wait,
the pump expels gas in the container, and
the control device controls operation of the pump.
9. The substrate processing apparatus according to claim 8 , wherein the control device makes the pump stop operating when a preset time has elapsed since the pump started operating.
10. The substrate processing apparatus according to claim 9 , wherein the control device makes the heater stop operating when a preset time has elapsed since the heater started operating,
the control device controls dispensing the chemical solution through the nozzle and detaches the solidified layer from the nozzle in the position in which the nozzle is made to wait, by preliminary dispensing of the chemical solution,
the control device controls the nozzle to move and, after the preliminary dispensing, moves the nozzle to a position over the substrate,
the control device makes the heater operate before the preliminary dispensing, and
the control device controls the nozzle to move and, before the heater is made to operate before the preliminary dispensing, moves the nozzle.
11. A substrate processing apparatus comprising:
a nozzle to dispense a chemical solution onto a substrate;
a control device that controls a mechanism which promotes evaporation of a solvent contained in the chemical solution remaining in the nozzle, thereby solidifying components contained in the remaining chemical solution to form a solidified layer in the nozzle; and
a container placed at a position in which the nozzle is made to wait and into which a tip of the nozzle is inserted, wherein
the mechanism includes a pump that generates air current around the nozzle in the position in which the nozzle is made to wait,
the pump expels gas in the container, and
the control device controls operation of the pump.
12. The substrate processing apparatus according to claim 11 , wherein the control device makes the pump stop operating when a preset time has elapsed since the pump started operating.
13. The substrate processing apparatus according to claim 11 , wherein the control device controls dispensing the chemical solution through the nozzle and detaches the solidified layer from the nozzle in the position in which the nozzle is made to wait, by preliminary dispensing of the chemical solution.
14. The substrate processing apparatus according to claim 13 , wherein the control device controls the nozzle to move and, after the preliminary dispensing, moves the nozzle to a position over the substrate.
15. The substrate processing apparatus according to claim 13 , wherein the mechanism includes a heater that supplies heat to the nozzle in the position in which the nozzle is made to wait, and
the control device makes the heater operate before the preliminary dispensing.
16. The substrate processing apparatus according to claim 15 , wherein the control device controls the nozzle to move and, before the heater is made to operate before the preliminary dispensing, moves the nozzle.
17. The substrate processing apparatus according to claim 16 , wherein the control device makes the pump stop operating when a preset time has elapsed since the pump started operating, and
the control device controls the nozzle to move and, after the preliminary dispensing, moves the nozzle to a position over the substrate.