Compliance control stitching in substrate materials
View Patent ↗Compliance control stitch patterns sewn or embroidered into biotextile or medical textile substrates impart reinforcing strength, and stretch resistance and control into such substrates. Compliance control stitch patterns may be customizable to particular patients, substrate implantation sites, particular degenerative or diseased conditions, or desired time frames. Substrates having compliance control stitch patterns sewn or embroidered into them may be used in tissue repair or tissue reconstruction applications.
1. A method for repairing or reconstructing soft tissue in the body of a subject in need thereof, the method comprising:
implanting, at a location in need of soft tissue repair or reconstruction, an implant comprising:
a substrate comprising a biotextile, medical textile, or both a biotextile and medical textile, and
two or more compliance control stitch patterns sewn or embroidered into the substrate, wherein the two or more compliance control stitch patterns comprises a first compliance control pattern overlaid onto and intersecting a second compliance control pattern, each of the first and second compliance control patterns have a zig-zag pattern with angle vertices, wherein the angle vertices of the first compliance control pattern interlock with corresponding angle vertices of the second compliance control pattern, forming a grid, so that the implant has a peak compliance strain at a load of 16 Newtons per centimeter (N/cm) that is between 10% and 30%.
2. The method according to claim 1 , wherein the location comprises a hernia.
3. The method according to claim 1 , wherein the location comprises a breast.
4. The method according to claim 1 , wherein the substrate comprises a biotextile, and the biotextile comprises an extracellular matrix.
5. The method according to claim 1 , wherein the two or more compliance control stitch patterns comprise monofilament threads or yarns comprising polyethylene or polypropylene.
6. The method according to claim 1 , wherein the two or more compliance control stitch patterns comprise threads or yarns comprising polypropylene.
7. The method according to claim 1 , wherein the first compliance control pattern has a higher density than the second compliance control pattern.
8. The method according to claim 1 , wherein the first compliance control pattern and the second compliance control pattern are each biaxial.
9. The method according to claim 1 , wherein the second compliance control stitch pattern is oriented in a different direction than the first compliance control stitch pattern.
10. The method according to claim 1 , wherein the first compliance control pattern and the second compliance control pattern are sewn or embroidered into a plurality of layers.
11. The method according to claim 1 , wherein the first compliance control pattern sewn or embroidered into a first layer, wherein the second compliance control pattern is sewn or embroidered into a second layer.
12. The method according to claim 11 , wherein the first layer is immediately adjacent to the second layer.
13. The method according to claim 1 , wherein the implant comprises a plurality of layers, and at least one of the layers comprises the first compliance control stitch pattern, and at least another of the layers comprises the second compliance control stitch pattern.
14. The method according to claim 1 , wherein the substrate comprises a medical textile comprising a biocompatible polymer.
15. The method according to claim 14 , wherein the medical textile comprises polypropylene.
16. The method according to claim 14 , wherein the medical textile comprises polyethylene.
17. The method according to claim 14 , wherein the two or more compliance control stitch patterns comprise monofilament threads or yarns comprising polyethylene.
18. The method according to claim 14 , wherein the two or more compliance control stitch patterns comprise threads or yarns comprising polypropylene.
19. The method according to claim 1 , wherein one of the two or more compliance control stitch patterns is sewn or embroidered into an end region of the substrate.
20. The method according to claim 19 , wherein another one of the two or more compliance control stitch patterns is sewn or embroidered into a middle region of the substrate.
21. The method according to claim 20 , wherein the compliance control stitch pattern sewn or embroidered into the end region of the substrate is different than the compliance control stitch pattern sewn or embroidered into the middle region of the substrate.
22. The method according to claim 1 , wherein the first compliance control pattern and the second compliance control pattern are sewn or embroidered into one layer.
23. The method according to claim 1 , wherein the peak compliance strain is based on measured displacement of the substrate as it is stretched along a plane of the substrate.
24. The method according to claim 1 , wherein the two or more compliance control stitch patterns provide biaxial, triaxial, or quadaxial compliance control.
25. The method according to claim 1 , wherein at least one of the two or more compliance control stitch patterns comprises thread or yarn that is bioresorbable so that the peak compliance strain of the implant changes over time.
26. A method for repairing or reconstructing soft tissue in the body of a subject in need thereof, the method comprising:
implanting, at a location in need of soft tissue repair or reconstruction, an implant comprising:
a substrate comprising one or more collagen sheets, and
two or more compliance control stitch patterns sewn or embroidered into the substrate, wherein the two or more compliance control stitch patterns comprises a grid including a first compliance control pattern overlaid with a second compliance control pattern, each of the first and second compliance control patterns have a zig-zag pattern with a plurality of angle vertices, wherein the angle vertices of the first compliance control pattern interlock with corresponding angle vertices of the second compliance control pattern, so that the implant has a peak compliance strain at a load of 16 Newton's per centimeter (N/cm) that is between 10% and 30%.
27. The method according to claim 26 , wherein the peak compliance strain is based on measured displacement of the substrate as it is stretched along a plane of the substrate.
28. The method according to claim 26 , wherein the two or more compliance control stitch patterns provide biaxial, triaxial, or quadaxial compliance control.