Color filter substrate and method for manufacturing the same
View Patent ↗A color filter substrate has a transparent base; a first transparent electrode layer; a black matrix having a plurality of black sections spaced from each other on the first transparent electrode layer; a second transparent electrode layer, and a color resistor layer, in sequence. A method for manufacturing the color filter substrate has steps of: forming a first transparent electrode layer on a transparent base; forming a black matrix having a plurality of black sections spaced from each other on the first transparent electrode layer; forming a second transparent electrode layer on the black sections and the first transparent electrode layer; and forming a color resistor layer on the second transparent electrode layer. The interference of the internal electric field is shielded by disposing the black sections between the first transparent electrode layer and the second transparent electrode layer.
1. A color filter substrate, comprising in sequence:
a transparent base;
a first transparent electrode layer formed on the transparent base;
a black matrix comprising a plurality of black sections spaced from each other on the first transparent electrode layer;
a second transparent electrode layer formed on the black sections and the first transparent electrode layer; and
a color resistor layer formed on the second transparent electrode layer, wherein a portion of the second transparent electrode layer is longitudinally disposed between the first transparent electrode layer and the color resistor layer;
wherein the black sections are disposed between the first transparent electrode layer and the second transparent electrode layer, and the black sections are sealed only by the first transparent electrode layer and the second transparent electrode layer in a sealed space that is commonly defined by the first transparent electrode layer and the second transparent electrode layer.
2. The color filter substrate according to claim 1 , wherein the color filter substrate further comprises a protective plane formed on the color resistor layer.
3. The color filter substrate according to claim 2 , wherein the color filter substrate further comprises a plurality of space units spaced from each other on the protective plane and aligned to a portion of the black sections.
4. The color filter substrate according to claim 2 , wherein a portion of the second transparent electrode layer is aligned to the black sections and directly contacts with the protective plane.
5. The color filter substrate according to claim 1 , wherein the color resistor layer comprises a plurality of color resistor units and each of the color resistor units is disposed between two of the black sections adjacent to each other.
6. The color filter substrate according to claim 5 , wherein a portion of the first transparent electrode layer is aligned to the color resistor units and is disposed between the second transparent electrode layer and the transparent base.
7. The color filter substrate according to claim 1 , wherein the portion of the second transparent electrode layer directly contacts with the first transparent electrode layer.
8. A method for manufacturing a color filter substrate, comprising steps of:
providing a transparent base;
forming a first transparent electrode layer on the transparent base;
forming a black matrix having a plurality of black sections spaced from each other on the first transparent electrode layer;
forming a second transparent electrode layer on the black sections and the first transparent electrode layer; and
forming a color resistor layer on the second transparent electrode layer;
wherein the black sections are disposed between the first transparent electrode layer and the second transparent electrode layer, and the black sections are sealed only by the first transparent electrode layer and the second transparent electrode layer in a sealed space that is commonly defined by the first transparent electrode layer and the second transparent electrode layer, wherein a portion of the second transparent electrode layer is longitudinally disposed between the first transparent electrode layer and the color resistor layer.
9. The method according to claim 8 , wherein after forming the color resistor layer, the method further comprises a step of:
forming a protective plane on the color resistor layer.
10. The method according to claim 9 , wherein the method further comprises a step of:
forming a plurality of space units aligned to a portion of the black sections on the protective plane.
11. The method according to claim 9 , wherein a portion of the second transparent electrode layer is aligned to the black sections and directly contacts with the protective plane.
12. The method according to claim 8 , wherein the color resistor layer comprises a plurality of color resistor units and each of the color resistor units is disposed between two of the black sections adjacent to each other.
13. The method according to claim 12 , wherein a portion of the first transparent electrode layer is aligned to the color resistor units and is disposed between the second transparent electrode layer and the transparent base.
14. The method according to claim 8 , wherein the portion of the second transparent electrode layer directly contacts with the first transparent electrode layer.