Semiconductor device including a solid state imaging device

1. A semiconductor integrated circuit device including an imaging device, comprising:

a first photodiode and a second photodiode formed separately from each other without an element isolating region in a semiconductor substrate and configuring a pixel of the imaging device; and

a floating diffusion capacitance section formed in the semiconductor substrate,

a first transfer transistor formed adjacently to the first photodiode in plan view,

a second transfer transistor formed adjacently to both the first photodiode and the second photodiode in plan view,

wherein the floating diffusion capacitance section is coupled to both a drain of the first transfer transistor and a drain of the second transfer transistor,

wherein the first photodiode is coupled to both a source of the first transfer transistor and a source of the second transfer transistor, and

wherein the second photodiode is coupled to the source of the second transfer transistor.

2. A semiconductor integrated circuit device according to claim 1 ,

wherein the second transfer transistor combines a charge of the first photodiode and a charge of the second photodiode, and transfers the combined charge to the floating diffusion capacitance section.

3. A semiconductor integrated circuit device according to claim 1 ,

wherein the first photodiode is formed along one side of the second transfer transistor,

wherein the second photodiode is formed along the other sides of the second transfer transistor,

wherein the first photodiode has a rectangular shape, and

wherein the second photodiode has a rectangular shape.

4. A semiconductor integrated circuit device according to claim 3 ,

wherein the first photodiode and the second photodiode are formed in a self-alignment manner using a gate electrode of the second transfer transistor.

5. A semiconductor integrated circuit device according to claim 4 ,

wherein a width of the gate electrode of the second transfer transistor is longer than both of a longitudinal direction width of the first photodiode and a longitudinal direction width of the second photodiode.

6. A semiconductor integrated circuit device according to claim 5 ,

wherein a distances between the first photodiode and the second photodiode is smaller than a length of the gate electrode of the second transfer transistor.

7. A semiconductor integrated circuit device according to claim 1 ,

wherein the drain of the first transfer transistor, the drain of the second transfer transistor, and the floating diffusion capacitance section are formed same conductivity type semiconductor region in the semiconductor substrate.

8. A semiconductor integrated circuit device according to claim 1 ,

wherein the first photodiode configure a first conductivity type semiconductor region and a second conductivity type semiconductor region being PN junction in the semiconductor substrate,

wherein the second photodiode configure the first conductivity type semiconductor region and the second conductivity type semiconductor region being PN junction in the semiconductor substrate, and

wherein the first conductivity type semiconductor region of the first photodiode, the first conductivity type semiconductor region of the second photodiode, the source of the first transfer transistor, and the source of the second transfer transistor are formed same conductivity type semiconductor region in the semiconductor substrate.

9. A semiconductor integrated circuit device according to claim 1 , wherein the first and the second transfer transistors are coupled in parallel between the first photodiode and the floating diffusion capacitance section.

10. A semiconductor integrated circuit device according to claim 1 , wherein the second transfer transistor comprises:

a first source region coupled to the first photodiode, a second source region coupled to the second photodiode, a gate electrode and a drain electrode coupled to the floating diffusion capacitance section.