METHOD OF MANUFACTURING MAGNETORESISTIVE ELEMENT
According to one embodiment, a method of manufacturing a magnetoresistive element, the method includes forming a first magnetic layer, forming a tunnel barrier layer on the first magnetic layer, forming a second magnetic layer on the tunnel barrier layer, forming a hard mask layer on the second magnetic layer, and patterning the second magnetic layer, the tunnel barrier layer, and the first magnetic layer, with a cluster ion beam using the hard mask layer as a mask, wherein the cluster ion beam comprises cluster ions, cluster sizes of the cluster ions are distributed, and a peak value of the distribution of the cluster sizes is 2 pieces or more and 1000 pieces or less.
1 - 23 . (canceled)
24 . A method of manufacturing a magnetoresistive element, the method comprising:
forming a first magnetic layer;
forming an insulating layer on the first magnetic layer;
forming a second magnetic layer on the insulating layer;
forming a mask layer on the second magnetic layer; and
partially deactivating the first magnetic layer or the second magnetic layer and etching the first magnetic layer or the second magnetic layer by a cluster ion beam including cluster ions, using the mask layer as a mask.
25 . The method of claim 24 , wherein the cluster ions include nonmagnetic atoms, and magnetization of each of the first and second magnetic layers is suppressed by the cluster ion beam.
26 . The method of claim 25 , wherein the nonmagnetic atoms having a concentration of more than 20 at % are included in an area which is deactivated by the cluster ion beam.
27 . The method of claim 25 , wherein
the nonmagnetic atoms include one of Ta, W, Hf, Zr, Nb, Mo, V, Cr, Si, Ge, P, As, Sb, O, N, Cl and F.
28 . The method of claim 24 , wherein cluster sizes of the cluster ions are distributed, and a peak value of the distribution of the cluster sizes is 2 pieces or more and 1000 pieces or less.
29 . The method of claim 24 , wherein after the cluster ion beam is emitted, auxiliary emission is executed using cluster ions of which cluster sizes are more than 1000 pieces and of which energy per one atom or molecule is equal to or less than 1 eV per atom or molecule.
30 . The method of claim 24 , wherein
the cluster ions include one of F 2 , CHF 3 , CF 4 , C 2 F 6 , C 2 HF 5 , CHClF 2 , NF 3 , SF 6 , ClF 3 , Cl 2 , HCl, CClF 3 , CHCl 3 , CBrF 3 , Br 2 , CO 2 , CO, N 2 , O 2 , NH 3 , N 2 O, and CH 3 OCH 3 , or one of He, Ne, Ar, Kr, Sb, and Xe.
31 . The method of claim 24 , wherein
the magnetoresistive element of which horizontal size is equal to or less than 30 nm is formed by the cluster ion beam.
32 . A method of manufacturing a magnetoresistive element, the method comprising:
forming a first magnetic layer;
forming an insulating layer on the first magnetic layer;
forming a second magnetic layer on the insulating layer;
forming a mask layer on the second magnetic layer; and
partially deactivating the first and second magnetic layers by a cluster ion beam including cluster ions after etching at least the second magnetic layer, using the mask layer as a mask.
33 . The method of claim 32 , wherein the cluster ions include nonmagnetic atoms, and magnetization of each of the first and second magnetic layers is suppressed by the cluster ion beam.
34 . The method of claim 33 , wherein the nonmagnetic atoms having a concentration of more than 20 at % are included in an area which is deactivated by the cluster ion beam.
35 . The method of claim 11 , wherein the nonmagnetic atoms include one of Ta, W, Hf, Zr, Nb, Mo, V, Cr, Si, Ge, P, As, Sb, O, N, Cl and F.
36 . The method of claim 32 , wherein cluster sizes of the cluster ions are distributed, and a peak value of the distribution of the cluster sizes is 2 pieces or more and 1000 pieces or less.
37 . The method of claim 32 , wherein the cluster ions include one of F 2 , CHF 3 , CF 4 , C 2 F 6 , C 2 HF 5 , CHClF 2 , NF 3 , SF 6 , ClF 3 , Cl 2 , HCl, CClF 3 , CHCl 3 , CBrF 3 , Br 2 , CO 2 , CO, N 2 , O 2 , NH 3 , N 2 O, and CH 3 OCH 3 , or one of He, Ne, Ar, Kr, Sb, and Xe.
38 . A method of manufacturing a magnetoresistive element, the method comprising:
forming a first magnetic layer;
forming an insulating layer on the first magnetic layer;
forming a second magnetic layer on the insulating layer;
forming a mask layer on the second magnetic layer; and
partially deactivating the first magnetic layer by a cluster ion beam including cluster ions after etching the second magnetic layer, using the mask layer as a mask.
39 . The method of claim 38 , wherein the cluster ions include nonmagnetic atoms, and magnetization of the first magnetic layer is suppressed by the cluster ion beam.
40 . The method of claim 39 , wherein the nonmagnetic atoms having a concentration of more than 20 at % are included in an area which is deactivated by the cluster ion beam.
41 . The method of claim 39 , wherein the nonmagnetic atoms include one of Ta, W, Hf, Zr, Nb, Mo, V, Cr, Si, Ge, P, As, Sb, O, N, Cl and F.
42 . The method of claim 38 , wherein cluster sizes of the cluster ions are distributed, and a peak value of the distribution of the cluster sizes is 2 pieces or more and 1000 pieces or less.
43 . The method of claim 38 , wherein the cluster ions include one of F 2 , CHF 3 , CF 4 , C 2 F 6 , C 2 HF 5 , CHClF 2 , NF 3 , SF 6 , ClF 3 , Cl 2 , HCl, CClF 3 , CHCl 3 , CBrF 3 , Br 2 , CO 2 , CO, N 2 , O 2 , NH 3 , N 2 O, and CH 3 OCH 3 , or one of He, Ne, Ar, Kr, Sb, and Xe.