IP Library Granted Patent US 9,808,772
Granted Patent B2
US 9,808,772 · App. 15/244,181 · Granted Nov 7, 2017

Gas separation membrane and gas separation membrane module

Inventor: Yusuke Mochizuki (Kanagawa, JP)
Assignee: FUJIFILM Corporation
B01D71/70B01D53/228B01D63/10B01D69/148B01D2256/245B01D2257/504B01D2325/30Y02C10/10
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Quick Facts
Patent No.
US 9,808,772
App. No.
15/244,181
Granted
Nov 7, 2017
Kind
B2
Abstract

Provided is a gas separation membrane including a support, a separation layer, and a protective layer in this order, in which the separation layer contains inorganic particles, the protective layer contains a resin and inorganic particles having an average particle diameter of 10 nm or greater which is less than 0.34 times the film thickness of the protective layer, and the content of the inorganic particles contained in the protective layer is 40% by mass or less with respect to the content of the resin contained in the protective layer, the gas separation membrane being capable of being made into a spiral type gas separation membrane module while maintaining high permeability; and a gas separation membrane module which uses the gas separation membrane.

Claims (21)

1. A gas separation membrane comprising:

a support;

a separation layer; and

a protective layer in this order,

wherein the separation layer contains inorganic particles,

the protective layer contains a resin and inorganic particles having an average particle diameter of 10 nm or greater which is less than 0.34 times the film thickness of the protective layer, and

the content of the inorganic particles contained in the protective layer is 40% by mass or less with respect to the content of the resin contained in the protective layer.

2. The gas separation membrane according to claim 1 , wherein the inorganic particles contained in the separation layer are an inorganic molecular sieve.

3. The gas separation membrane according to claim 1 , wherein the content of the inorganic particles contained in the protective layer is in a range of 1% by mass to 40% by mass with respect to the content of the resin contained in the protective layer.

4. The gas separation membrane according to claim 1 , wherein the inorganic particles contained in the separation layer are an inorganic molecular sieve.

5. The gas separation membrane according to claim 1 wherein the film thickness of the protective layer is 1000 nm or less.

6. The gas separation membrane according to claim 1 , wherein the resin contained in the protective layer is polysiloxane.

7. The gas separation membrane according to claim 1

wherein the separation layer further includes a resin, and

the content of the inorganic particles contained in the separation layer is in a range of 5% by mass to 40% by mass with respect to the content of the resin contained in the separation layer.

8. The gas separation membrane according to claim 1 , further comprising:

a resin layer between the support and the separation layer,

wherein the resin layer contains a resin and inorganic particles having an average particle diameter of 10 nm or greater which is less than 0.34 times the film thickness of the resin layer, and

the content of the inorganic particles contained in the resin layer is 40% by mass or less with respect to the content of the resin contained in the resin layer.

9. A gas separation membrane module which uses the gas separation membrane according to claim 1 .

10. The gas separation membrane module according to claim 9 which is a spiral type gas separation membrane module.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 23, 2016
From: MOCHIZUKI, YUSUKE
To: FUJIFILM CORPORATION
Reel/Frame 039506/0902 →
Priority Claims (1)
JP 2014-038832 · Feb 28, 2014 · national
Continuity (2)
Continuation PCTJP2015055539 · Feb 26, 2015
Related Publication 20160354731A1 · Dec 8, 2016