Semiconductor device
According to one embodiment, a semiconductor device includes a substrate, semiconductor chips mounted on the substrate, a sealing resin layer that seals the semiconductor chips, and a film covering at least an upper surface of the sealing resin layer, the film made from a material selected from the group consisting of zinc, aluminum, manganese, alloys thereof, metal oxides, metal nitrides, and metal oxynitrides.
1. A semiconductor device comprising:
a substrate;
semiconductor chips mounted on the substrate;
a sealing resin layer disposed over and sealing the semiconductor chips, the sealing resin layer having an upper surface and side surfaces; and
a film entirely covering the upper surface of the sealing resin layer, the film made from a material selected from the group consisting of zinc, aluminum, manganese, alloys thereof, metal oxides, metal nitrides, and metal oxynitrides, wherein side surfaces of the sealing resin layer are exposed.
2. The device according to claim 1 ,
wherein the film has a Young's modulus exceeding 30 GPa and a thermal expansion coefficient exceeding 16.2×10 −6 ° C.
3. The device according to claim 2 ,
wherein the film has a thickness equal to or greater than 0.5 μm and equal to or less than 5 μm.
4. The device according to claim 3 ,
wherein a thickness of the sealing resin layer between an upper surface of the semiconductor chips and a lower surface of the film is equal to or less than 300 μm.
5. The device according to claim 1 , wherein the film is made from a metal compound.
6. A semiconductor device comprising:
a substrate;
semiconductor chips mounted on the substrate;
a sealing resin layer disposed over and sealing the semiconductor chips, the sealing resin layer having an upper surface and side surfaces; and
a film entirely covering the upper surface of the sealing resin layer, the film having a thickness equal to or greater than 0.5 μm and equal to or less than 5 μm, wherein the film is made from a material selected from the group consisting of zinc, aluminum, manganese, alloys thereof, metal oxides, metal nitrides, and metal oxynitrides, wherein side surfaces of the sealing resin layer are exposed.
7. The device according to claim 6 , wherein the film is made from a material having a Young's modulus equal to or higher than 50 GPa.
8. The device according to claim 7 , further comprising a conductive shield layer that connects to a ground wire at the side surface of the substrate.
9. The semiconductor device of claim 6 , wherein a thickness of the sealing resin layer on between an upper surface of the semiconductor chips and a lower surface of the film is equal to or less than 300 μm.
10. A semiconductor device comprising:
a substrate;
semiconductor chips mounted on the substrate;
a sealing resin layer disposed over and sealing the semiconductor chips, the sealing resin layer having an upper surface and side surfaces; and
a film covering at least an upper surface of the sealing resin layer, the film made from a material selected from the group consisting of zinc, manganese, alloys thereof, metal oxides, metal nitrides, and metal oxynitrides.
11. The device according to claim 10 ,
wherein the film has a Young's modulus exceeding 30 GPa and a thermal expansion coefficient exceeding 16.2×10 −6 ° C.
12. The device according to claim 11 ,
wherein the film has a thickness equal to or greater than 0.5 μm and equal to or less than 5 μm.
13. The device according to claim 12 ,
wherein a thickness of the sealing resin layer on the semiconductor chips is equal to or less than 300 μm.
14. The device according to claim 13 ,
wherein the film covers only the upper surface of the sealing resin layer, and the device further comprises at least one of a conductive shield layer and a protective layer covering a front surface of the film, a side surface of the sealing resin layer, and a side surface of the substrate.
15. The device according to claim 10 , wherein the film is made from a metal compound.
16. The device according to claim 15 , further comprising at least one of a conductive shield layer and a protective layer.
17. The device according to claim 16 , wherein the conductive shield layer covers a front surface of the film, a side surface of the sealing resin layer, and a side surface of the substrate.
18. The device according to claim 17 , wherein the protective layer is corrosion resistant.