Manufacturing method of semiconductor device and template for nanoimprint
According to one embodiment, there is provided a manufacturing method of a semiconductor device. The method includes forming a film to be processed on a substrate. The method includes forming a first resist pattern on the film, the first resist pattern having a first stepped structure including a plurality of steps. The method includes forming a second resist pattern on the first resist pattern by use of a template for nanoimprint. The second resist pattern has a second stepped structure, which is arranged corresponding to the first stepped structure and is formed such that a step-up surface extends perpendicularly to a flat surface. The method includes processing the film through the second resist pattern and the first resist pattern.
1. A template for nanoimprint, comprising:
a pattern face having a stepped structure including a plurality of steps; and
a rear face opposite to the pattern face,
wherein the pattern face includes
a first flat surface,
a first perpendicular surface extending from a first end of the first flat surface, in a direction perpendicular to the first flat surface and with an orientation going away from the rear face,
a second flat surface extending from a first end of the first perpendicular surface, in a first direction along the rear face and with an orientation going away from the first flat surface,
a second perpendicular surface extending from a first end of the second flat surface, in a direction perpendicular to the second flat surface and with an orientation going away from the rear face,
a third flat surface extending from a first end of the second perpendicular surface, in the first direction and with an orientation going away from the second flat surface,
a third perpendicular surface extending from a first end of the third flat surface, in a direction perpendicular to the third flat surface and with an orientation going away from the rear face, and
a fourth flat surface extending from a first end of the third perpendicular surface, in the first direction and with an orientation going away from the third flat surface.
2. The template for nanoimprint according to claim 1 , wherein,
in the direction perpendicular to the first flat surface, a width of the first perpendicular surface, a width of the second perpendicular surface, and a width of the third perpendicular surface are substantially equal to each other.
3. The template for nanoimprint according to claim 1 , wherein
the pattern face further includes
a fourth perpendicular surface extending from a second end of the first flat surface, in a direction perpendicular to the first flat surface and with an orientation going away from the rear face,
a fifth flat surface extending from a first end of the fourth perpendicular surface, in a second direction along the rear face and with an orientation going away from the first flat surface,
a fifth perpendicular surface extending from a first end of the fifth flat surface, in a direction perpendicular to the fifth flat surface and with an orientation going away from the rear face,
a sixth flat surface extending from a first end of the fifth perpendicular surface, in the second direction and with an orientation going away from the fifth flat surface,
a sixth perpendicular surface extending from a first end of the sixth flat surface, in a direction perpendicular to the sixth flat surface and with an orientation going away from the rear face, and
a seventh flat surface extending from a first end of the sixth perpendicular surface, in the second direction and with an orientation going away from the sixth flat surface.
4. The template for nanoimprint according to claim 3 , wherein,
in the direction perpendicular to the first flat surface, a width of the fourth perpendicular surface, a width of the fifth perpendicular surface, and a width of the sixth perpendicular surface are substantially equal to each other.