Substrate production method, substrate processing apparatus, and substrate production system
A substrate cleaning method includes: steps (a) to (d). In step (a), a liquid is supplied onto a nanoimprint template substrate that has a patterned surface with foreign particles to form a liquid film on the patterned surface. In step (b), the liquid film is solidified to form a solidified film including the foreign particles. In step (c), the substrate is reversed. In step (d), the solidified film is melted to remove the foreign particles.
1. A substrate production system comprising:
a substrate processing unit that includes:
a holding mechanism including a rotation stage and a holder which holds a substrate, the substrate having a patterned surface on an upper surface thereof, the holder spacing the substrate from the rotation stage to expose a back surface of the substrate, the back surface opposite the upper surface;
a first supplying mechanism which supplies a liquid onto the patterned surface while the substrate is positioned on the holder to form a liquid film
a second supplying mechanism which supplies a liquid to the patterned surface after the substrate is reversed;
a movable solidifying mechanism which solidifies the liquid film on the patterned surface to form a solidified film; and
a thawing mechanism which thaws the solidified film;
a substrate reversing unit that includes a reversing mechanism which reverses the substrate;
a substrate transporting unit that transfers the substrate between the substrate processing unit and the substrate reversing unit; and
a controller configured to:
control the first supplying mechanism to form the liquid film onto the patterned surface and control the movable solidifying mechanism to solidify the liquid film in the substrate processing unit;
after the liquid film is solidified, control the substrate transporting unit to transfer the substrate to the substrate reversing unit to reverse the substrate, and transfer the reversed substrate back to the substrate processing unit; and
simultaneously control the thawing mechanism to thaw the solidified film and the second supplying mechanism to supply the liquid to rinse the patterned surface of the substrate.
2. The system of claim 1 , wherein the movable solidifying mechanism having a heat absorbing surface that extends in a first direction, faces the upper surface of the substrate, and moves across the upper surface of the substrate to absorb heat from the upper surface of the substrate and solidify a liquid film formed on the patterned surface.
3. The system of claim 2 , wherein a heat absorber for the movable solidifying mechanism and a heating device for the thawing mechanism are included in a movable member.
4. The system of claim 3 , further comprising a moving mechanism that moves the movable member above the holding mechanism.
5. The system of claim 1 , further comprising a cylindrical treatment cup housing the holding mechanism.
6. The system of claim 5 , wherein the thawing mechanism is positioned outside the cylindrical treatment cup.
7. The system of claim 5 , wherein the movable solidifying mechanism is positioned outside the cylindrical treatment cup.
8. The system of claim 7 , wherein the second supplying mechanism is positioned within the cylindrical treatment cup.
9. The system of claim 5 , wherein the substrate production system further comprises a loading and unloading unit arranged along the substrate transporting unit on a side opposite the substrate reversing unit.
10. The system of claim 5 , wherein the substrate reversing mechanism includes opposing supporting mechanisms supporting opposite sides of the substrate.
11. The system of claim 5 , wherein the movable solidifying mechanism further comprises a cleaning mechanism, the cleaning mechanism comprising a UV radiation device.
12. The system of claim 5 , wherein the thawing mechanism includes an infrared lamp.
13. The substrate production system of claim 1 , wherein the first supplying mechanism is provided on an opposite side of the second supplying mechanism with respect to the substrate positioned on the holder.
14. The substrate production system of claim 1 , wherein the second supplying mechanism is provided on a side of the rotation stage with respect to the substrate.
15. The substrate production system according to claim 1 , wherein the second supplying mechanism is arranged outside the substrate processing unit below the rotation stage.
16. A substrate production system comprising:
a substrate processing unit that includes:
a holding mechanism including a rotation stage and a holder which holds a substrate, the substrate having a patterned surface on an upper surface thereof, the holder spacing the substrate from the rotation stage to expose a back surface of the substrate, the back surface opposite the upper surface;
a cylindrical treatment cup housing the holding mechanism;
a first supplying mechanism which supplies a liquid onto the patterned surface while the substrate is positioned on the holder to form a liquid film
a second supplying mechanism which supplies a liquid to the patterned surface after the substrate is reversed, the second supplying mechanism positioned within the cylindrical treatment cup;
a movable solidifying mechanism which solidifies the liquid film on the patterned surface to form a solidified film; and
a thawing mechanism which thaws the solidified film, the thawing mechanism positioned outside the cylindrical treatment cup;
a substrate reversing unit that includes a reversing mechanism which reverses the substrate;
a substrate transporting unit that transfers the substrate between the substrate processing unit and the substrate reversing unit; and
a controller configured to:
control the first supplying mechanism to form the liquid film onto the patterned surface and control the movable solidifying mechanism to solidify the liquid film in the substrate processing unit;
after the liquid film is solidified, control the substrate transporting unit to transfer the substrate to the substrate reversing unit to reverse the substrate, and transfer the reversed substrate back to the substrate processing unit; and
simultaneously control the thawing mechanism to thaw the solidified film and the second supplying mechanism to supply the liquid to rinse the patterned surface of the substrate.
17. The system of claim 16 , wherein the substrate production system further comprises a loading and unloading unit arranged along the substrate transporting unit on a side opposite the substrate reversing unit.
18. The system of claim 17 , wherein the substrate reversing mechanism includes opposing supporting mechanisms supporting opposite sides of the substrate.
19. The system of claim 18 , wherein the movable solidifying mechanism further comprises a cleaning mechanism, the cleaning mechanism comprising a UV radiation device.
20. The system of claim 19 , wherein the thawing mechanism includes an infrared lamp.
21. A substrate production system comprising:
a substrate processing unit that includes:
a holding mechanism including a rotation stage and a holder which holds a substrate, the substrate having a patterned surface on an upper surface thereof, the holder spacing the substrate from the rotation stage to expose a back surface of the substrate, the back surface opposite the upper surface;
a first supplying mechanism which supplies a liquid onto the patterned surface while the substrate is positioned on the holder to form a liquid film
a second supplying mechanism which supplies a liquid to the patterned surface after the substrate is reversed;
a movable solidifying mechanism which solidifies the liquid film on the patterned surface to form a solidified film; and
a thawing mechanism which thaws the solidified film;
a substrate reversing unit that includes a reversing mechanism which reverses the substrate;
a substrate transporting unit that transfers the substrate between the substrate processing unit and the substrate reversing unit; and
a controller configured to:
control the first supplying mechanism to form the liquid film onto the patterned surface and control the movable solidifying mechanism to solidify the liquid film in the substrate processing unit;
after the liquid film is solidified, control the substrate transporting unit to transfer the substrate to the substrate reversing unit to reverse the substrate, and transfer the reversed substrate back to the substrate processing unit such that the solidified film does now thaw; and
simultaneously control the thawing mechanism to thaw the solidified film and the second supplying mechanism to supply the liquid to rinse the patterned surface of the substrate.