Monomers, polymers and photoresist compositions
In one preferred embodiment, polymers are provided that comprise a structure of the following Formula (I): Photoresists that comprises such polymers also are provided.
1. A polymer comprising a structure of the following Formula (I):
wherein:
X and X′ are the same or different linker;
R is a non-hydrogen substituent; and
A and B are each independently hydrogen or fluorine;
R′ and R″ are each independently hydrogen or a non-hydrogen substituent,
with at least one of R′ and R″ being a non-hydrogen substituent other than a halogen or a halogen-substituted group.
2. A polymer of claim 1 wherein R′ and R″ are each independently hydrogen, fluorine, halogenated alkyl, non-halogenated alkyl, or heteroalkyl.
3. A polymer of claim 1 wherein X and X′ are different.
4. A polymer of claim 1 wherein X and X′ are the same.
5. A polymer of claim 1 wherein at least one of X and X′ is —CH 2 —.
6. A polymer of claim 1 comprising a structure of the following Formula (IIB)
wherein in Formula (IIB):
X, X′ and X″ are each the same or different linker;
A, B and C are each independently hydrogen or fluorine; and
R′, R″ and R′″ are each independently hydrogen or a non-hydrogen substituent.
7. A polymer of claim 1 wherein the polymer comprises acrylate units.
8. A polymer of claim 1 wherein the polymer comprises units obtained by polymerization of one or more monomers of the following Formula (III):
wherein in Formula (III):
Y is optionally substituted alkyl;
X and X′ are the same or different linker;
R is a non-hydrogen substituent;
A and B are each independently hydrogen or fluorine; and
R′ and R″ are each independently hydrogen or a non-hydrogen substituent,
with at least one of R′ and R″ being a non-hydrogen substituent other than a halogen or a halogen-substituted group.
9. A polymer of claim 1 wherein at least one of A and B is fluorine.
10. A photoresist composition comprising a photoactive component and a polymer of claim 1 .
11. A photoresist composition of claim 10 further comprising a second distinct polymer.
12. A method of processing a photoresist composition, comprising:
applying a layer of a photoresist composition of claim 10 on a substrate;
exposing the photoresist composition layer to activating radiation; and
developing the exposed photoresist composition to provide a photoresist relief image.
13. The method of claim 12 wherein the photoresist composition layer is immersion exposed.
14. A photoresist composition comprising
a photoactive component and a polymer of claim 6 .
15. A polymer comprising a polymerized monomer of one of the following structures:
16. A polymer of claim 6 wherein the polymer comprising a polymerized monomer of one of the following structures:
17. A photoresist composition comprising a photoactive component and a polymer of claim 15 .
18. A photoresist composition comprising a photoactive component and a polymer of claim 17 .