POLISHING MEMBER AND SEMICONDUCTOR MANUFACTURING METHOD
A polishing member according to an embodiment includes a first polisher, a second polisher, and a third polisher. The first polisher is capable of rubbing a target surface. The second polisher is surrounded by the first polisher. A hole is located along an edge of the second polisher between the first polisher and the second polisher. The third polisher connects the first polisher and the second polisher.
1 . A polishing member comprising:
a first polisher capable of rubbing a target surface;
a second polisher surrounded by the first polisher, the second polisher having a hole along an edge of the second polisher between the second polisher and the first polisher; and
a third polisher connecting the first polisher and the second polisher.
2 . The member of claim 1 , wherein a smallest width of the third polisher is smaller than a largest width of the second polisher.
3 . The member of claim 1 , wherein the hole has a substantially horseshoe shape in a planar view.
4 . The member of claim 2 , wherein the hole has a substantially horseshoe shape in a planar view.
5 . The member of claim 1 , wherein the hole has a substantially spiral shape in a planar view.
6 . The member of claim 2 , wherein the hole has a substantially spiral shape in a planar view.
7 . The member of claim 1 , wherein
the first polisher has a peripheral edge in a substantially circular shape and rubs the target surface in a range of the first polisher between a first circle concentric with the first polisher and a second circle having a larger diameter than that of the first circle and being concentric with the first polisher,
a plurality of the holes are located at intervals in at least one of a radial direction and a circumferential direction of the first polisher to intersect with a circle being concentric with the first polisher and having an arbitrary diameter equal to or larger than the diameter of the first circle and equal to or smaller than the diameter of the second circle, and
a plurality of the second polishers and a plurality of the third polishers are provided to correspond to the through holes, respectively.
8 . The member of claim 2 , wherein
the first polisher has a peripheral edge in a substantially circular shape and rubs the target surface in a range of the first polisher between a first circle concentric with the first polisher and a second circle having a larger diameter than that of the first circle and being concentric with the first polisher,
a plurality of the holes are located at intervals in at least one of a radial direction and a circumferential direction of the first polisher to intersect with a circle being concentric with the first polisher and having an arbitrary diameter equal to or larger than the diameter of the first circle and equal to or smaller than the diameter of the second circle, and
a plurality of the second polishers and a plurality of the third polishers are provided to correspond to the through holes, respectively.
9 . The member of claim 3 , wherein
the first polisher has a peripheral edge in a substantially circular shape and rubs the target surface in a range of the first polisher between a first circle concentric with the first polisher and a second circle having a larger diameter than that of the first circle and being concentric with the first polisher,
a plurality of the holes are located at intervals in at least one of a radial direction and a circumferential direction of the first polisher to intersect with a circle being concentric with the first polisher and having an arbitrary diameter equal to or larger than the diameter of the first circle and equal to or smaller than the diameter of the second circle, and
a plurality of the second polishers and a plurality of the third polishers are provided to correspond to the through holes, respectively.
10 . The member of claim 5 , wherein
the first polisher has a peripheral edge in a substantially circular shape and rubs the target surface in a range of the first polisher between a first circle concentric with the first polisher and a second circle having a larger diameter than that of the first circle and being concentric with the first polisher,
a plurality of the holes are located at intervals in at least one of a radial direction and a circumferential direction of the first polisher to intersect with a circle being concentric with the first polisher and having an arbitrary diameter equal to or larger than the diameter of the first circle and equal to or smaller than the diameter of the second circle, and
a plurality of the second polishers and a plurality of the third polishers are provided to correspond to the through holes, respectively.
11 . The member of claim 2 , wherein
a plurality of the holes are located in a uniform positioning state, and
a plurality of the second polishers and a plurality of the third polishers are provided to correspond to the holes, respectively.
12 . The member of claim 3 , wherein
a plurality of the holes are located in a uniform positioning state, and
a plurality of the second polishers and a plurality of the third polishers are provided to correspond to the holes, respectively.
13 . The member of claim 5 , wherein
a plurality of the holes are located in a uniform positioning state, and
a plurality of the second polishers and a plurality of the third polishers are provided to correspond to the holes, respectively.
14 . The member of claim 1 , wherein
a plurality of the holes are located,
a plurality of the second polishers and a plurality of the third polishers are provided to correspond to the holes, respectively, and
orientations of the third polishers with respect to the second polishers are different between nearest ones of the second polishers.
15 . The member of claim 2 , wherein
a plurality of the holes are located,
a plurality of the second polishers and a plurality of the third polishers are provided to correspond to the holes, respectively, and
orientations of the third polishers with respect to the second polishers are different between nearest ones of the second polishers.
16 . The member of claim 3 , wherein
a plurality of the holes are located,
a plurality of the second polishers and a plurality of the third polishers are provided to correspond to the holes, respectively, and
orientations of the third polishers with respect to the second polishers are different between nearest ones of the second polishers.
17 . The member of claim 5 , wherein
a plurality of the holes are located,
a plurality of the second polishers and a plurality of the third polishers are provided to correspond to the holes, respectively, and
orientations of the third polishers with respect to the second polishers are different between nearest ones of the second polishers.
18 . The member of claim 7 , wherein orientations of the third polishers with respect to the second polishers are different between nearest ones of the second polishers.
19 . The member of claim 11 , wherein orientations of the third polishers with respect to the second polishers are different between nearest ones of the second polishers.
20 . A semiconductor manufacturing method comprising:
pressing a target surface against a surface of a polishing member comprising a first polisher capable of rubbing the target surface, a second polisher surrounded by the first polisher, the second polisher having a hole along an edge of the second polisher between the second polisher and the first polisher, and a third polisher connecting the first polisher and the second polisher,
supplying a polishing solution to the surface of the polishing member and inside the hole, and
rotating the polishing member to rub the target surface, and moving the second polisher relative to the hole to supply the polishing solution in the hole to the surface of the polishing member.