TRANSPARENT HEAT-SHIELDING/HEAT-INSULATING MEMBER AND PRODUCTION METHOD THEREOF

1 . A transparent heat-shielding/heat-insulating member comprising a transparent substrate and a functional layer formed on the transparent substrate,

wherein the functional layer includes, from the transparent substrate side, an infrared reflective layer and a protective layer in this order,

the infrared reflective layer includes, from the transparent substrate side, at least a metal layer, and a metal suboxide layer in which a metal is partially oxidized, in this order,

the protective layer has a total thickness of 200 to 980 nm, and includes, from the infrared reflective layer side, at least a high refractive index layer and a low refractive index layer in this order.

2 . The transparent heat-shielding/heat-insulating member according to claim 1 ,

wherein the metal suboxide layer in which a metal is partially oxidized has a thickness of 1 to 8 nm.

3 . The transparent heat-shielding/heat-insulating member according to claim 1 ,

wherein the protective layer includes, from the infrared reflective layer side, a medium refractive index layer, a high refractive index layer and a low refractive index layer in this order.

4 . The transparent heat-shielding/heat-insulating member according to claim 1 ,

wherein the protective layer includes, from the infrared reflective layer side, an optical adjustment layer, a medium refractive index layer, a high refractive index layer and a low refractive index layer in this order,

the optical adjustment layer has a refractive index at a wavelength of 550 nm of 1.60 to 2.00 and a thickness of 30 to 80 nm,

the medium refractive index layer has a refractive index at a wavelength of 550 nm of 1.45 to 1.55 and a thickness of 40 to 200 nm,

the high refractive index layer has a refractive index at a wavelength of 550 nm of 1.65 to 1.95 and a thickness of 60 to 550 nm, and

the low refractive index layer has a refractive index at a wavelength of 550 nm of 1.30 to 1.45 and a thickness of 70 to 150 nm.

5 . The transparent heat-shielding/heat-insulating member according to claim 1 ,

wherein the metal suboxide layer in which a metal is partially oxidized includes a titanium component.

6 . The transparent heat-shielding/heat-insulating member according to claim 1 ,

wherein a layer of the protective layer in contact with the infrared reflective layer includes titanium oxide fine particles.

7 . The transparent heat-shielding/heat-insulating member according to claim 1 ,

wherein the metal layer of the infrared reflective layer includes silver and has a thickness of 3 to 20 nm.

8 . The transparent heat-shielding/heat-insulating member according to claim 1 ,

wherein a cholesteric liquid crystal polymer layer is further formed on a surface of the transparent substrate on which the infrared reflective layer is not formed.

9 . The transparent heat-shielding/heat-insulating member according to claim 8 ,

wherein the cholesteric liquid crystal polymer layer is formed by photopolymerization of a material containing a liquid crystal compound having a polymerizable functional group, a chiral agent having a polymerizable functional group and a multifunctional acrylate compound.

10 . The transparent heat-shielding/heat-insulating member according to claim 1 ,

wherein in a reflection spectrum measured according to JIS R3106-1998,

if a “virtual line a” parallel to wavelength axis passes through an average value of a maximum reflectance and a minimum reflectance of the reflection spectrum at a wavelength of 500 to 570 nm, and a point corresponding to a wavelength of 535 nm on the “virtual line a” is a point A;

a “virtual line b” parallel to wavelength axis passes through an average value of a maximum reflectance and a minimum reflectance of the reflection spectrum at a wavelength of 620 to 780 nm, and a point corresponding to a wavelength of 700 nm on the “virtual line b” is a point B; and

a straight line passing through the point A and the point B that is extended to a wavelength of 500 to 780 nm is a reference line AB,

when comparing a reflectance value of the reflection spectrum and a reflectance value of the reference line AB at a wavelength of 500 to 570 nm, if an absolute value of a difference in reflectance value between the reflection spectrum and the reference line AB at a wavelength where the difference in reflectance value between the reflection spectrum and the reference line AB is maximized is defined as a maximum variation difference Δ A, a value of the maximum variation difference Δ A expressed by percentage of reflectance is 7% or less, and

when comparing a reflectance value of the reflection spectrum and a reflectance value of the reference line AB at a wavelength of 620 to 780 nm, if an absolute value of a difference in reflectance value between the reflection spectrum and the reference line AB at a wavelength where the difference in reflectance value between the reflection spectrum and the reference line AB is maximized is defined as a maximum variation difference Δ B, a value of the maximum variation difference Δ B expressed by percentage of reflectance is 9% or less.

11 . The transparent heat-shielding/heat-insulating member according to claim 1 ,

wherein a normal emissivity based on JIS R3106-1998 is 0.22 or less on the functional layer side.

12 . The transparent heat-shielding/heat-insulating member according to claim 1 ,

wherein after a 1000-hour weather resistance test according to JIS A5759, separation of the protective layer is not observed in a cross cut adhesion test according to JIS D0202-1998.

13 . A method for producing the transparent heat-shielding/heat-insulating member according to claim 1 , the method comprising:

forming an infrared reflective layer on a transparent substrate by a dry coating method; and

forming a protective layer on the infrared reflective layer by a wet coating method.

14 . The method for producing the transparent heat-shielding/heat-insulating member according to claim 13 ,

wherein the dry coating method is a reactive spattering method.