Display device substrate, display device, electronic apparatus, and method for manufacturing display device substrate
A first substrate includes: a first base material including an insulating layer; and a partition wall disposed on the insulating layer. The insulating layer and the partition wall are formed of a resin material. The partition wall has a higher hardness than the insulating layer. A protective film that protects the insulating layer is disposed on a surface of the insulating layer. A portion of the protective film is located between the partition wall and the insulating layer.
1. A method for manufacturing a display device substrate, comprising:
disposing an insulating layer of a resin material on a substrate;
disposing a protective film on the insulating layer;
removing a portion of the protective film; and
disposing a partition wall of a resin material to cover the insulating layer at a place where the portion of the protective film is removed.
2. The method of claim 1 wherein the protective film comprises silicon nitride (SiN).
3. The method of claim 1 wherein the partition wall of a resin material comprises a photosensitive resin material.
4. The method of claim 3 further comprising patterning the photosensitive resin material using photolithography.