IP Library Granted Patent US 10,109,331
Granted Patent B2
US 10,109,331 · App. 15/261,815 · Granted Oct 23, 2018

Magnetic storage device with a wiring having a ferromagnetic layer

Inventor: Motoyuki Sato (Seoul, KR)
Assignee: TOSHIBA MEMORY CORPORATION
G11C11/161G11C11/165G11C11/1673G11C11/1675H05K999/99
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,109,331
App. No.
15/261,815
Granted
Oct 23, 2018
Kind
B2
Abstract

According to one embodiment, a magnetic storage device includes memory cells, wherein each of the memory cell includes: a wiring including a first ferromagnetic layer and a first nonmagnetic layer disposed on the first ferromagnetic layer; a magnetoresistive effect element including a second ferromagnetic layer disposed on the first nonmagnetic layer, a third ferromagnetic layer, and a second nonmagnetic layer disposed between the second and the third ferromagnetic layer; a first transistor having a first terminal connected to the first ferromagnetic layer, and a second terminal connected to a source line; and a second transistor having a first terminal connected to the third ferromagnetic layer, and a second terminal connected to a bit line.

Claims (33)

1. A magnetic storage device comprising:

a plurality of memory cells; and

one wire including a first ferromagnetic layer and a first nonmagnetic layer disposed on the first ferromagnetic layer,

wherein each of the plurality of memory cells includes:

a magnetoresistive effect element including a second ferromagnetic layer disposed on the first nonmagnetic layer, a third ferromagnetic layer, and a second nonmagnetic layer disposed between the second ferromagnetic layer and the third ferromagnetic layer;

a first transistor having a first terminal and a second terminal, the first terminal being electrically connected to the first ferromagnetic layer without interposing the second terminal, and the second terminal being electrically connected to a source line without interposing the first terminal; and

a second transistor having a first terminal electrically connected to the third ferromagnetic layer without interposing the wire, and a second terminal directly connected to a bit line which is different from the source line, and

wherein each of the second ferromagnetic layers is disposed on the first nonmagnetic layer such that the one wire, which is only one wire, interconnects all the magnetoresistive effect elements without interposing any other ferromagnetic layers between any two of the second ferromagnetic layers, and

wherein at a time of a write operation on a selected memory cell of the memory cells, the first transistor of the selected memory cell is turned on and the second transistor of the selected memory cell is turned off, and at a time of a read operation on the selected memory cell, the first and second transistors of the selected memory cell are turned on.

2. The device of claim 1 , wherein a magnetization orientation of the first ferromagnetic layer and a magnetization orientation of the third ferromagnetic layer are parallel to each other.

3. The device of claim 2 , wherein in the wire an electric current flows from the first ferromagnetic layer to the first nonmagnetic layer, at a time of a write operation of reversing a magnetization orientation of the second ferromagnetic layer to be antiparallel to the magnetization orientation of the third ferromagnetic layer.

4. The device of claim 2 , wherein in the wire an electric current flows from the first nonmagnetic layer to the first ferromagnetic layer, at a time of a write operation of reversing a magnetization orientation of the second ferromagnetic layer to be parallel to the magnetization orientation of the third ferromagnetic layer.

5. The device of claim 1 , wherein a magnetization orientation of the first ferromagnetic layer and a magnetization orientation of the third ferromagnetic layer are antiparallel to each other.

6. The device of claim 5 , wherein in the wire an electric current flows from the first nonmagnetic layer to the first ferromagnetic layer, at a time of a write operation of reversing a magnetization orientation of the second ferromagnetic layer to be antiparallel to the magnetization orientation of the third ferromagnetic layer.

7. The device of claim 5 , wherein in the wire an electric current flows from the first ferromagnetic layer to the first nonmagnetic layer, at a time of a write operation of reversing a magnetization orientation of the second ferromagnetic layer to be parallel to the magnetization orientation of the third ferromagnetic layer.

8. The device of claim 1 , wherein the time of the write operation is a time of a write operation of reversing a magnetization orientation of the second ferromagnetic layer to be antiparallel to a magnetization orientation of the third ferromagnetic layer, and

the second transistor of the selected memory cell is turned on at a time of a write operation of reversing the magnetization orientation of the second ferromagnetic layer to be parallel to the magnetization orientation of the third ferromagnetic layer.

9. The device of claim 1 , comprising:

a first set of the plurality of memory cells and the wire; and

a second set of the plurality of memory cells and the wire,

wherein:

a gate electrode of the first transistor of a first memory cell of the first set of the memory cells is electrically connected to a gate electrode of the first transistor of a first memory cell of the second set of the memory cells, and

a gate electrode of the second transistor of the first memory cell of the first set of the memory cells is electrically connected to a gate electrode of the second transistor of the first memory cell of the second set of the memory cells.

10. The device of claim 1 , wherein the first transistor includes a conductive oxide film for a channel region.

11. The device of claim 1 , wherein the first transistor includes a surrounding gate structure.

12. The device of claim 1 , wherein the first transistor is disposed on a surface of a semiconductor substrate.

13. The device of claim 1 , wherein the second transistor includes a conductive oxide film for a channel region.

14. The device of claim 1 , wherein the second transistor includes a surrounding gate structure.

15. The device of claim 1 , wherein the second transistor is disposed on a surface of a semiconductor substrate.

16. The device of claim 1 , wherein the first ferromagnetic layer and the first nonmagnetic layer are disposed over the wire.

17. The device of claim 1 , wherein the first ferromagnetic layer includes CoFe.

18. The device of claim 1 , wherein the first nonmagnetic layer includes Cu.

19. The device of claim 1 , wherein at the time of the write operation, a magnetization orientation of the second ferromagnetic layer of the selected memory cell is reversed by spins accumulated in the first nonmagnetic layer by a current flowing between the first ferromagnetic layer and the first nonmagnetic layer.

Assignments (5)
MERGER Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: K.K. PANGEA
Reel/Frame 055659/0471 →
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 055669/0001 →
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 055669/0401 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 14, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043194/0382 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 7, 2016
From: SATO, MOTOYUKI
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 039967/0418 →
Continuity (2)
Provisional Application 62301996 · Mar 1, 2016
Related Publication 20170256298A1 · Sep 7, 2017