Laser processing system for monitoring impure gas in laser optical path
A laser processing system herein includes a laser oscillator, a laser optical path that guides laser beam from the laser oscillator to a workpiece, a purge gas supply line for supplying a purge gas into the laser optical path, oxygen sensor and an impure gas sensor which detects an impure gas influencing the propagation of the laser beam that are installed in the laser optical path, and an impure gas sensor output value correction unit. The impure gas sensor output value correction unit corrects an output value of the impure gas sensor based on an output value of the oxygen sensor.
1. A laser processing system comprising:
a laser oscillator configured to oscillate a laser beam;
a laser optical path that guides the laser beam from the laser oscillator to an object to be processed;
an oxygen sensor for detecting oxygen and one or more impure gas sensors for detecting an impure gas influencing propagation of the laser beam that are installed in the laser optical path;
an impure gas sensor output value correction unit that is configured to correct an output value of the impure gas sensor based on an output value of the oxygen sensor; and
an impure gas mixing determination unit that is configured to determine whether or not the impure gas was mixed in the laser optical path, based on a comparison between the output value of the impure gas sensor that is corrected by the impure gas sensor output value correction unit and a determination threshold value that is stored in advance.
2. The laser processing system according to claim 1 , comprising at least two impure gas sensors that have different detection concentrations.
3. The laser processing system according to claim 1 , comprising at least two impure gas sensors that detect different gas types.
4. The laser processing system according to claim 1 , further comprising a communication device that is configured to communicate a mixing of the impure gas when the impure gas mixing determination unit determines that the impure gas was mixed in the laser optical path.
5. The laser processing system according to claim 1 , further comprising:
an impure gas adsorbent that adsorbs the impure gas; and
an exposure function part that is configured to expose the impure gas adsorbent in the laser optical path when the impure gas mixing determination unit determines that the impure gas was mixed in the laser optical path.
6. The laser processing system according to claim 1 , further comprising a storage unit that stores the output value of each of the impure gas sensor and the oxygen sensor together with date and hour at which the output value is outputted.
7. The laser processing system according to claim 1 , wherein
the laser optical path is provided with a detachable sensor unit, and
the sensor unit includes the oxygen sensor and at least one of the impure gas sensors.
8. The laser processing system according to claim 1 , comprising a purge gas supply line for supplying a purge gas into the laser optical path, wherein the purge gas is air that is supplied into the laser optical path through a high polymer filter, an activated carbon filter, a hollow fiber filter, or an oil mist filter.
9. The laser processing system according to claim 1 , wherein the oxygen sensor or the impure gas sensor is a controlled potential electrolysis type gas sensor, a galvanic cell type gas sensor, a catalytic combustion type gas sensor, a gas heat conduction type gas sensor, a zirconia type gas sensor, a polaro type gas sensor, or a semiconductor type gas sensor.
10. A laser processing system comprising:
a laser oscillator configured to oscillate a laser beam;
a laser optical path that guides the laser beam from the laser oscillator to an object to be processed;
an oxygen sensor for detecting oxygen and at least two impure gas sensors for detecting different gas types of impure gases influencing propagation of the laser beam that are installed in the laser optical path; and
an impure gas sensor output value correction unit that is configured to correct an output value of the impure gas sensor based on an output value of the oxygen sensor.
11. A laser processing system comprising:
a laser oscillator configured to oscillate a laser beam;
a laser optical path that guides the laser beam from the laser oscillator to an object to be processed;
an oxygen sensor for detecting oxygen and one or more impure gas sensors for detecting an impure gas influencing propagation of the laser beam that are installed in the laser optical path; and
an impure gas sensor output value correction unit that is configured to correct an output value of the impure gas sensor based on an output value of the oxygen sensor; wherein
the laser optical path is provided with a detachable sensor unit, and
the sensor unit includes the oxygen sensor and at least one of the impure gas sensors.
12. A laser processing system comprising:
a laser oscillator configured to oscillate a laser beam;
a laser optical path that guides the laser beam from the laser oscillator to an object to be processed;
an oxygen sensor for detecting oxygen and an impure gas sensor for detecting an impure gas influencing propagation of the laser beam that are installed in the laser optical path;
an impure gas sensor output value correction unit that is configured to correct an output value of the impure gas sensor based on an output value of the oxygen sensor; and
a purge gas supply line for supplying a purge gas into the laser optical path; wherein
the purge gas is air that is supplied into the laser optical path through a high polymer filter, an activated carbon filter, a hollow fiber filter, or an oil mist filter.