Multi-layer X-ray source fabrication
Fabrication of a multi-layer X-ray source is disclosed using bulk structures to fabricate a multi-layer target structure. In one implementation, layers of X-ray generating material, such as tungsten, are interleaved with thermally conductive layers, such as diamond layers. To prevent delamination of the layers, various mechanical, chemical, and/or structural approaches may also be employed.
1. A method of fabricating a multi-layer source target for X-ray generation, comprising:
interleaving foils made of X-ray generating material with a layer made of thermally-conductive material to form an interleaved stack wherein the layer of thermally-conductive material is sandwiched between the foils of X-ray generating material; and
performing one thermal cycle operation on the interleaved stack while directly pressing each of the foils of X-ray generating material with opposing disks of the X-ray generating material to compression bond the interleaved stack into the multi-layer source target.
2. The method of claim 1 , wherein the X-ray generating material comprises tungsten, molybdenum, tungsten-rhenium, tungsten-rhodium, molybdenum-rhodium, or titanium-zirconium-molybdenum alloy (TZM).
3. The method of claim 1 , wherein the thermally-conductive material comprises diamond.
4. The method of claim 1 , further comprising providing one or more binding enhancers between at least one of the foils of the X-ray generating material and the layer of thermally-conductive material.
5. The method of claim 4 , wherein the one or more binding enhancers comprise one or more of an alloy containing as one constituent the X-ray generating material, hydro-carbon, active carbon, gold, platinum, silver, or copper.
6. The method of claim 1 , wherein the foils made of X-ray generating material have a thickness in the range of 0.5 μm to 50 μm.
7. The method of claim 1 , wherein the layer of the thermally-conductive material has a thickness in the range of 5 μm to 50 μm.
8. A method of fabricating a multi-layer source target for X-ray generation, comprising:
interleaving tungsten foils with a diamond layer to form an interleaved stack wherein the diamond layer is sandwiched between the tungsten foils; and
performing one thermal cycle operation on the interleaved stack while directly pressing each of the tungsten foils with opposing tungsten disks to compression bond the interleaved stack into the multi-layer source target.
9. The method of claim 8 , wherein the tungsten foils have a thickness in the range of 0.5 μm to 50 μm.
10. The method of claim 9 , wherein the diamond layer has a thickness in the range of 5 μm to 50 μm.
11. The method of claim 8 , further comprising providing one or more binding enhancers between at least one of the tungsten foils and the diamond layer.