Methods for removing halogenated ethylene impurities in 2, 3, 3, 3-tetrafluoropropene product
Disclosed is a composition comprised of at least one compound selected from 2,3,3,3-tetrafluoropropene, 1,3,3,3-tetrafluoro-1-propene and 1-chloro-3,3,3-trifluoropropene and halogenated impurity selected from the group consisting of HFO-1141 (CH 2 ═CHF), HCFO-1140 (CH 2 ═CHCl), and HCFO-1131 (CH 2 ═CFCl and/or trans/cis-CHF═CHCl) and combination thereof, said halogenated impurity being present in said composition in an amount of 50 ppm or less.
1. A composition comprised of 2,3,3,3-tetrafluoropropene and first halogenated impurity comprised of HCFO-1140 (CH 2 ═CHCl) said halogenated impurity being present in said composition in an amount greater than 0 ppm but less than or equal to 50 ppm, said 2,3,3,3-tetrafluoropropene being present in at least 90% by weight of said composition.
2. The composition according to claim 1 wherein said first halogenated impurity is present in said composition in an amount greater than 0 ppm but less than or equal to 20 ppm.
3. The composition according to claim 1 wherein said first halogenated impurity is present in said composition in an amount greater than 0 but less than or equal to 10 ppm.
4. The composition according to claim 1 wherein a second impurity selected from CF 3 C≡CH, HFO-1243zf (CF 3 CH═CH 2 ), HFO-1234ze (E/Z-CF 3 CH═CHF), HCFO-1233zd (E/Z-CF 3 CH═CHCl), HCFO-1233xf (CF 3 CCl═CH 2 ) and combination thereof is additionally present.
5. The composition according to claim 2 wherein a second impurity selected from CF 3 C≡CH, HFO-1243zf (CF 3 CH═CH 2 ), HFO-1234ze (E/Z-CF 3 CH═CHF), HCFO-1233zd (E/Z-CF 3 CH═CHCl), HCFO-1233xf (CF 3 CCl═CH 2 ) and combination thereof is additionally present.
6. The composition according to claim 3 wherein a second impurity selected from CF 3 C≡CH, HFO-1243zf (CF 3 CH═CH 2 ), HFO-1234ze (E/Z-CF 3 CH═CHF), HCFO-1233zd (E/Z-CF 3 CH═CHCl), HCFO-1233xf (CF 3 CCl═CH 2 ) and combination thereof is additionally present.
7. The composition according to claim 6 wherein the second impurity is HFO-1243zf (CF 3 CH═CH 2 ), HFO-1234ze (E/Z-CF 3 CH═CHF), or HCFO-1233xf (CF 3 CCl═CH 2 ).
8. The composition according to claim 1 additionally comprising a third halogenated impurity selected from the group consisting of HFO-1141 (CH 2 ═CHF), and HCFO-1131 (CH 2 ═CFCl and/or trans/cis-CHF═CHCl) and combination thereof, said third halogenated impurity and CH 2 ═CHCl being present in said composition in an amount greater than 0 ppm and less than or greater 50 ppm.
9. The composition according to claim 8 wherein said third halogenated impurity and CH 2 ═CHCl is present in said composition in an amount greater than 0 ppm and less than or greater 20 ppm.
10. The composition according to claim 8 wherein said third halogenated impurity and CH 2 ═CHCl is present in said composition in an amount greater than 0 ppm and less than or greater 10 ppm.
11. The composition according to claim 1 additionally comprising 1,3,3,3 tetrafluoro-1-propene.
12. The composition according to claim 8 , wherein said third halogenated impurity is CH 2 ═CFCl.
13. The composition according to claim 11 wherein 1,3,3,3-tetrafluoro-1-propene is present in its Z-form.
14. The composition according to claim 11 wherein 1,3,3,3-tetrafluoro-1-propene is present in its E-form.