X-ray fluorescence system with high flux and high flux density
We present a micro-x-ray fluorescence (XRF) system having a high-brightness x-ray illumination system with high x-ray flux and high flux density. The higher brightness is achieved in part by using x-ray target designs that comprise a number of microstructures of x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux x-ray source may then be coupled to an x-ray optical system, which can collect and focus the high flux x-rays to spots that can be as small as one micron, leading to high flux density at the fluorescent sample. Such systems may be useful for a variety of applications, including mineralogy, trace element detection, structure and composition analysis, metrology, as well as forensic science and diagnostic systems.
1. An x-ray fluorescence system comprising:
an x-ray illumination system comprising an x-ray source;
a mount to hold an object to be examined;
a means for moving the mount; and
an x-ray detector;
in which the x-ray source additionally comprises:
a vacuum chamber;
a window transparent to x-rays attached to the wall of the vacuum chamber;
and, within the vacuum chamber:
at least one electron beam emitter, and
an anode target comprising:
a substrate comprising a first selected material, and
a planar first surface, from which thickness is measured in a direction perpendicular to the first planar surface, and
two orthogonal lateral dimensions are measured parallel to the first planar surface; and
a plurality of discrete structures embedded into the first planar surface of the substrate such that each of the plurality of discrete structures is in thermal contact with the substrate,
the plurality of discrete structures comprising:
one or more materials selected for its x-ray generation properties;
in which at least two of the plurality of discrete structures are arranged on an axis; in which the axis is parallel to the first planar surface of the substrate;
in which the axis passes through the first window;
in which each of the discrete structures has a thickness of less than 20 microns, and
in which each of the plurality of discrete structures has a lateral dimension in the direction of the axis of less than 50 microns; and
a means of directing electrons emitted by the at least one electron beam emitter onto the at least two arranged discrete structures such that x-rays are generated from each of the at least two arranged discrete structures;
in which at least a portion of the generated x-rays propagating on the axis from each of the two arranged discrete structures is transmitted through the window; and said system further comprising:
an optical train having an optical axis positioned to correspond to the axis on which the at least two discrete structures are arranged;
in which the optical train is further positioned to collect x-rays generated by the anode target and produce an x-ray beam with predetermined beam properties; and
in which the x-ray optical train comprises reflective elements positioned to reflect x-rays generated by the x-ray source and focus a portion of the reflected x-rays to a predetermined location; and
in which the means of moving the mount comprises translation and rotation controls so that the position of the object to be examined can be adjusted to coincide with the predetermined location where the portion of the x-rays are focused; and
in which the detector is positioned to collect fluorescence emitted by the object when illuminated by the focused x-rays and generate corresponding electronic signals.
2. The x-ray fluorescence system of claim 1 , in which the detector comprises a PIN photodiode.
3. The x-ray fluorescence system of claim 1 , in which the detector comprises a silicon drift detector.
4. The x-ray fluorescence system of claim 3 , in which the silicon drift detector has a hole through its center such that the incident beam of x-rays travels through the hole to impinge on the object to be examined.
5. The x-ray fluorescence system of claim 1 , in which the detector is selected from the group consisting of:
a lithium drifted silicon detector and a lithium drifted germanium detector.
6. The x-ray fluorescence system of claim 1 , in which the detector comprises a instrument selected from the group consisting of:
an energy dispersive x-ray spectrometer,
an x-ray microcalorimeter spectrometer, and
a wavelength-dispersive x-ray spectrometer comprising at least one monochromator and an x-ray detector selected from the group consisting of:
an ionization chamber, and a proportional counter.
7. The x-ray fluorescence system of claim 1 , in which the plurality of discrete structures are arranged in a linear array along said axis; and
the optical train is also aligned along said axis.
8. The x-ray fluorescence system of claim 1 , in which the plurality of discrete structures are arranged such that x-rays generated by a predetermined number of the plurality of discrete structures when exposed to an electron beam from the electron beam emitter are transmitted through a predetermined one of the discrete structures selected from the plurality of discrete structures.
9. The x-ray fluorescence system of claim 1 , in which the plurality of discrete structures comprises three or more structures.
10. The x-ray fluorescence system of claim 1 , in which the optical train comprises one or more x-ray optical components that are axially symmetric.
11. The x-ray fluorescence system of claim 1 , in which the first selected material is selected from the group consisting of:
beryllium, diamond, graphite, silicon, boron nitride, silicon carbide, sapphire, and diamond-like carbon.
12. The x-ray fluorescence system of claim 1 , in which the one or more materials selected for its x-ray generation properties is selected from the group consisting of:
aluminum, titanium, vanadium, chromium, manganese, iron, cobalt, nickel, copper, gallium, zinc, yttrium, zirconium, molybdenum, niobium, ruthenium, rhodium, palladium, silver, tin, iridium, tantalum, tungsten, indium, cesium, barium, gold, platinum, lead, and combinations and alloys thereof.
13. The x-ray fluorescence system of claim 1 , in which the optical train comprises an x-ray reflector with a surface corresponding to a quadric surface.
14. The x-ray fluorescence system of claim 13 , in which the quadric surface is selected from the group consisting of:
a spheroid, an ellipsoid, a paraboloid, a hyperboloid, an elliptic cylinder, a circular cylinder, an elliptic cone, and a circular cone.
15. The x-ray fluorescence system of claim 1 , in which the optical train comprises a Wolter x-ray optic.
16. The x-ray fluorescence system of claim 1 , additionally comprising:
a monochromator to select x-rays of a predetermined energy and bandwidth from the x-ray beam,
said monochromator additionally having the capability of scanning the selected x-rays over a predetermined energy range.
17. The x-ray fluorescence system of claim 16 , in which the x-rays emerging from the monochromator have a predetermined energy bandwidth that is less than 10 eV.
18. The x-ray fluorescence system of claim 16 , in which the monochromator comprises a channel cut crystal comprising a material selected from the group consisting of:
silicon, germanium, lithium fluoride, and indium antimonide.
19. The x-ray fluorescence system of claim 16 , in which the monochromator comprises a double crystal monochromator.
20. The x-ray fluorescence system of claim 16 , additionally comprising:
an x-ray focusing optical element positioned between the monochromator and the mount.