UV lamp and method for irradiating a surface, a liquid or a gas with UV radiation
A UV lamp including a filter material of doped quartz glass is provided that effects a transparency as high as possible for operating radiation in the ultraviolet spectral range above 210 nm together with low transparency in the wavelength range below about 190 nm. The filter material of doped quartz glass includes at least 99 wt. % of SiO 2 and Al 2 O 3 , wherein the Al 2 O 3 portion is in the range of 2 wt. % to 4 wt. The filter material has an edge wavelength at a wavelength below 190 nm and a spectral transmission of 80% mm −1 or higher at a wavelength of 210 nm.
1. A UV lamp for operating radiation with wavelengths in the ultraviolet spectral range, the UV lamp comprising:
an optical path in which a filter material of doped quartz glass is provided,
wherein the doped quartz glass includes at least 99 wt. % of SiO 2 and Al 2 O 3 , the Al 2 O 3 portion being in the range of 2 wt. % to 4 wt. %,
wherein the filter material has an edge wavelength at a wavelength below 190 nm, and
wherein the filter material has a spectral transmission of 80% mm −1 or higher at a wavelength of 210 nm.
2. The UV lamp according to claim 1 , wherein the doped quartz glass has a hydroxyl group content of less than 200 wt. ppm.
3. The UV lamp according to claim 1 , wherein a beam exit window is provided that consists of the filter material of the doped quartz glass or is coated with the doped quartz glass.
4. The UV lamp according to claim 3 , wherein the beam exit window is coated with a layer of amorphous aluminum oxide at its side facing a lamp interior.
5. The UV lamp according to claim 1 , wherein the UV lamp is a deuterium lamp.
6. The UV lamp according to claim 1 , wherein the filter material has an edge wavelength at a wavelength in the range of 180 to 190 nm.
7. The UV lamp according to claim 1 , wherein the doped quartz glass of the filter material contains synthetically produced SiO 2 .
8. The UV lamp according to claim 1 , wherein the doped quartz glass of the filter material has a hydroxyl group content of than 1 wt. ppm.
9. A method for irradiating a surface, a liquid or a gas with UV radiation using an optical filter material of doped quartz glass, the method comprising:
guiding the UV radiation through the optical filter material of doped quartz glass,
wherein the doped quartz glass includes at least 99 wt. % of SiO 2 and Al 2 O 3 , the Al 2 O 3 portion being in the range of 2 wt. % to 4 wt. %,
wherein the optical filter material has an edge wavelength at a wavelength below 190 nm, and
wherein the optical filter material has a spectral transmission of 80% mm −1 or higher at a wavelength of 210 nm.
10. The method according to claim 9 , wherein at least the SiO 2 portion of the doped quartz glass is synthetically produced.
11. The method according to claim 9 , wherein the doped quartz glass has a hydroxyl group content of less than 200 wt. ppm.
12. The method according to claim 11 , wherein the doped quartz glass has a hydroxyl group content of less than 1 wt. ppm.
13. The UV lamp according to claim 2 , wherein the doped quartz glass has a hydroxyl group content of less than 10 wt. ppm.