Contact connection structure for removing oxide buildup
A contact connection structure includes: a first contact portion including an indent portion spherically protruding, the first contact portion including a plating layer formed on a surface of the first contact portion; and a second contact portion including a plating layer formed on a surface of the second contact portion. The indent portion of the first contact portion is slidable on a contact surface of the second contact portion. The indent portion of the first contact portion at a terminal insertion completed position is in contact with the second contact portion. The contact surface of the second contact portion includes an oxide-film shaving portion having an annular arc portion curved along a circumference portion of the indent portion.
1. A contact connection structure comprising:
a first contact portion including an indent portion spherically protruding toward a second contact portion, the first contact portion including a plating layer formed on an outer surface of the first contact portion including the indent portion; and
the second contact portion including a plating layer formed on a surface of the second contact portion, wherein
the indent portion of the first contact portion and a contact surface of the second contact portion are slidable on each other,
the contact surface of the second contact portion includes an oxide-film shaving portion having an annular arc portion that makes contact along a circumference portion of the indent portion, and
the indent portion of the first contact portion is in contact with the oxide-film shaving portion of the second contact portion at a terminal insertion completed position.
2. The contact connection structure according to claim 1 , wherein the oxide-film shaving portion has a protruding shape with a leading end of the oxide-film shaving portion having an acute angle.
3. The contact connection structure according to claim 1 , wherein the oxide-film shaving portion comprises an annular groove portion having an edge portion as the annular arc portion.
4. The contact connection structure according to claim 1 , wherein the outer surface of the first contact portion including the indent portion comprises a base material upon which the plating layer is formed, an outer surface of the base material provided with an unevenness formed thereon to inhibit movement of the plating layer.
5. The contact connection structure according to claim 4 , wherein the unevenness is regularly arranged lengthwise and crosswise.
6. The contact connection structure according to claim 4 , wherein the unevenness is randomly arranged.