Optoelectroic semiconductor chip and method of producing an optoelectronic semiconductor chip

1. An optoelectronic semiconductor chip comprising:

a semiconductor layer sequence with an upper face and a lower face opposite the upper face, wherein the semiconductor layer sequence has an active layer that generates electromagnetic radiation, and

a plurality of contact elements that electrically contact the semiconductor layer sequence arranged on the upper face, wherein

the semiconductor chip is a thin-film semiconductor chip,

the lower face is a radiation decoupling surface through which the radiation generated in the semiconductor layer sequence is decoupled,

the contact elements can be electrically actuated individually and independently from one another, and

the semiconductor layer sequence has a thickness of at most 3 μm.

2. The optoelectronic semiconductor chip according to claim 1 , wherein the radiation decoupling surface has a roughening with a roughness, said roughness being equal to or less than 200 nm.

3. The optoelectronic semiconductor chip according to claim 1 , wherein the semiconductor layer sequence is continuous and free of recesses.

4. The optoelectronic semiconductor chip according to claim 1 , wherein

trenches are introduced in the semiconductor layer sequence,

the trenches extend from the upper face in the direction of the lower face, and

each contact element is partially or entirely surrounded by a trench in a plan view of the upper face.

5. The optoelectronic semiconductor chip according to claim 1 , wherein the contact elements have a lateral extent parallel to the extension direction of the upper face of at most 50 μm, and the distance of two neighboring contact elements is at most 20 μm, respectively.

6. The optoelectronic semiconductor chip according to claim 1 , wherein the contact elements are arranged on the upper side of the semiconductor layer sequence in a matrix.

7. The optoelectronic semiconductor chip according to claim 1 , wherein a common active matrix element is applied to a plurality of the contact elements, said active matrix element selectively electrically actuating the individual contact elements.

8. The optoelectronic semiconductor chip according to claim 1 , wherein the contact elements comprise or consist of a mirroring material.

9. The optoelectronic semiconductor chip according to claim 1 , wherein a further contact element that electrically contacts the semiconductor layer sequence is applied to the radiation decoupling surface, and the further contact element comprises or consists of an electrically conductive, transparent material and/or comprises a metal grid.

10. The optoelectronic semiconductor chip according to claim 1 , wherein

a further contact element that electrically contacts the semiconductor layer sequence is arranged in the trenches, and

the radiation decoupling surface is free of contact elements.

11. The optoelectronic semiconductor chip according to claim 1 , wherein a conductive protection layer is applied to sides of the contact elements facing away from the semiconductor layer sequence.

12. The optoelectronic semiconductor chip according to claim 1 , wherein the contact elements have side surfaces running transversely to the upper face of the semiconductor layer sequence, and an insulation layer is applied to the side surfaces.

13. The optoelectronic semiconductor chip according to claim 1 , wherein a defect density on a semiconductor layer adjoining the radiation decoupling surface is at most 5·10 8 cm −2 .

14. A method of producing an optoelectronic semiconductor chip comprising:

a) providing a growth substrate;

b) growing a semiconductor layer sequence on the growth substrate, wherein the semiconductor layer sequence comprises an active layer that generates electromagnetic radiation;

c) forming a plurality of contact elements that can individually and independently be actuated on a side of the semiconductor layer sequence facing away from the growth substrate, wherein

each contact element distinctly is assigned to a pixel, which appears luminous to an observer during operation;

d) arranging a carrier on the contact elements;

e) removing the growth substrate; and

at least partially stripping the semiconductor layer sequence until a thickness of the semiconductor layer sequence is 3 μm maximum, by which an optical cross talk of neighboring pixels is reduced, and a defect density in the semiconductor layer, adjacent to the radiation decoupling face, is at most 5·10 8 cm 2 .

15. The method according to claim 14 , wherein after stripping a radiation decoupling surface of the semiconductor layer sequence is formed by polishing so that a roughening of the radiation decoupling surface develops with a roughness of at most 200 nm.

16. The method according to claim 14 , wherein, in b), first a buffer layer sequence is applied to the growth substrate, on which the active layer is grown.

17. The method according to claim 16 , wherein, in f), the buffer layer sequence is partially or entirely removed.

18. The method according to claim 14 , wherein the semiconductor layer sequence is applied to the growth substrate by a sputtering process.

19. An optoelectronic semiconductor chip comprising:

a semiconductor layer sequence with an upper face and a lower face opposite the upper face, wherein the semiconductor layer sequence has an active layer that generates electromagnetic radiation; and

a plurality of contact elements that electrically contact the semiconductor layer sequence arranged on the upper face, wherein

the semiconductor chip is a thin-film semiconductor chip,

the lower face is a radiation decoupling surface through which the radiation generated in the semiconductor layer sequence is decoupled,

the contact elements can be electrically actuated individually and independently from one another,

each contact element is assigned to a pixel that appears luminous to an observer during operation, and

the semiconductor layer sequence has a thickness of at most 3 μm, by which an optical cross talk of neighboring pixels is reduced, and a defect density in the semiconductor layer, adjacent to the radiation decoupling face, is at most 5·10 8 cm 2 .

20. An optoelectronic semiconductor chip comprising:

a semiconductor layer sequence with an upper face and a lower face opposite the upper face, wherein the semiconductor layer sequence has an active layer that generates electromagnetic radiation,

a plurality of contact elements that electrically contact the semiconductor layer sequence arranged on the upper face, and

a plurality of pixels that emit radiation when operated, wherein

the semiconductor chip is a thin-film semiconductor chip,

the lower face is a radiation decoupling surface through which the radiation generated in the semiconductor layer sequence is decoupled,

the contact elements can be electrically actuated individually and independently from one another,

each contact element is assigned to a pixel, and

the semiconductor layer sequence has a thickness of at most 3 μm.