Slurry composition and method of use
View Patent ↗A slurry composition for use in chemical-mechanical polishing sapphire substrates and includes an alkaline pH adjuster and an accelerant.
1. An aqueous slurry composition comprising:
alumina particles;
an alkaline pH adjuster selected from the group consisting of sodium hydroxide, potassium hydroxide, lithium hydroxide, cesium hydroxide, and combinations thereof; and
a cationic organic polishing accelerant including at least one central atom with a positive charge attached to four organic-based pendant groups and balanced with a negatively charged anion;
wherein a pH value of the slurry is in the range of 12 to 13.
2. The aqueous slurry composition according to claim 1 , wherein the central atom is nitrogen or phosphorous.
3. The aqueous slurry composition according to claim 1 , wherein the negatively charged anion is selected from the group consisting of hydroxide, chloride, bromide, iodide, nitrate, sulfate, phosphate and combinations thereof.
4. The aqueous slurry composition according to claim 1 , wherein the cationic organic polishing accelerant is one or more selected from tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrabutylammonium hydroxide, tetrabutylammonium bromide, cetyl trimethylammonium bromide (CTAB), cetyl trimethylammonium chloride (CTAC), benzalkonium chloride, poly(2-methacryloyloxyethyltrimethyl ammonium chloride), tetramethylphosphonium chloride, hydroxyethyl cellulose dimethyl diallylammonium chloride copolymer (Polyquaternium-4), poly(2-methacryloxyethyltrimethyl ammonium chloride), and cationic guar.
5. The aqueous slurry composition according to claim 1 , wherein the alumina particles have an average particle size (D 50 ) of from about 0.02 μm to about 7.0 μm.
6. The aqueous slurry composition according to claim 1 , wherein the alkaline pH adjuster is potassium hydroxide.
7. The aqueous slurry composition according to claim 1 , wherein a pH value of the slurry is in the range of 12 to 12.5.
8. The aqueous slurry composition according to claim 1 , wherein the alumina particles include at least 70% alpha crystal phase.
9. A method of polishing a sapphire substrate comprising introducing an aqueous slurry composition between a polishing pad and the substrate when the polishing pad and substrate are pressed into contact with each other and moving relative to each other, wherein the aqueous slurry composition comprises:
alumina particles; and
a cationic organic polishing accelerant including at least one central atom with a positive charge attached to four organic-based pendant groups and balanced with a negatively charge anion;
wherein a pH value of the slurry is in the range of 12 to 13.
10. The method of claim 9 , wherein the central atom is nitrogen or phosphorous.
11. The method of claim 9 , wherein the negatively charged anion is selected from hydroxide, chloride, bromide, iodide, nitrate, sulfate, and phosphate.
12. The method of claim 9 , wherein the cationic organic polishing accelerant is selected from the group consisting of tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrabutylammonium hydroxide, tetrabutylammonium bromide, cetyl trimethylammonium bromide (CTAB), cetyl trimethylammonium chloride (CTAC), benzalkonium chloride, poly (2-methacryloyloxyethyltrimethyl ammonium chloride), tetramethylphosphonium chloride, hydroxyethyl cellulose dimethyl diallylammonium chloride copolymer (Polyquaternium-4), poly(2-methacryloxyethyltrimethyl ammonium chloride), and cationic guar, and combinations thereof.
13. The method of claim 9 , wherein the alumina particles have an average particle size (D 50 ) of from about 0.02 km to about 7.0 μm.
14. The method of claim 9 , wherein the slurry composition further comprises an alkaline pH adjuster consisting of one or more selected from sodium hydroxide, potassium hydroxide, lithium hydroxide, and cesium hydroxide.
15. The method of claim 14 , wherein the alkaline pH adjuster is potassium hydroxide.
16. The method of claim 9 , wherein a pH value of the slurry is in the range of 12 to 12.5.
17. The method of claim 9 , wherein the alumina particles include at least 70% alpha crystal phase.
18. A sapphire substrate polished by the aqueous slurry composition of claim 1 .
19. A sapphire substrate polished by the method of claim 9 .