Process for physical vapor deposition of a material layer on surfaces of a plurality of substrates

1. A process of physical vapor deposition of a material layer on surfaces of a plurality of substrates, wherein:

the plurality of substrates are arranged on a dome which rotates according to a dome rotation axis and where the substrates are placed at least two different distances (IN,EX) from the dome rotation axis;

the material to be deposited is vacuum evaporated thanks to an energy beam from a target which is made of said material and has a first main surface and an edge located around said main surface;

the energy beam interacts with a beam impact surface of the target chosen within the list consisting of a part of the main surface and a part of the edge of the target and wherein the material diffuses from the target to the substrates around a main diffusion axis which intersects the dome at an intersection point, I; and

the angle α between the dome rotation axis and the main diffusion axis is chosen within the ranges of +5° to +40° or −5° to −40°,

wherein the first main surface of the target is a main surface which faces the substrates and wherein the process comprises a preliminary step consisting of providing an orientated main surface so that said main surface is orientated with said angle α being chosen within said ranges, and

wherein the target is arranged and fixed in a tiltable liner and wherein the preliminary step of providing said orientated main surface of the target may be obtained by tilting the liner.

2. The process according to claim 1 , wherein the main diffusion axis is the axis perpendicular to the tangent plane of the beam impact surface and intersecting the dome rotation axis.

3. The process according to claim 1 , wherein the edge of the target has a cylindrical shape and faces the substrates and wherein the process comprises a preliminary step consisting in tuning the energy beam so as said energy beam impacts only the edge of the target.

4. The process according to claim 1 , wherein the dome has a circular peripheral contour which is centered at the dome rotation axis and is a peripheral contour radius, PCR, apart from the dome rotation axis, and wherein the intersection point, I, is situated at a distance from the dome rotation axis which is comprised between 0.20×PCR and 0.90×PCR.

5. The process according to claim 4 , wherein the intersection point, I, is situated at a distance from the dome rotation axis which is comprised between 0.30×PCR and 0.85×PCR, as for example between 0.35×PCR and 0.80×PCR.

6. The process according to claim 1 , wherein the dome has a circular peripheral contour which is centered at the dome rotation axis and has a peripheral contour radius, PCR, comprised between 0.50 m and 1.20 m.

7. The process according to claim 1 , wherein the substrates are ophthalmic spectacle lenses.

8. The process according to claim 1 , wherein the material to be deposited is selected from the group consisting of ZrO 2 , SiO 2 , MgF 2 , MgO, indium tin oxide, SnO 2 , TiO 2 and Ta 2 O 5 .

9. A process for depositing a plurality of material layers on a plurality of substrates wherein at least two targets of the same material are used to implement the steps of the process according to claim 1 and where the main diffusion axes provided by said targets are orientated according to two different α angles.