IP Library Granted Patent US 10,097,191
Granted Patent B2
US 10,097,191 · App. 15/332,185 · Granted Oct 9, 2018

Atomic oscillator

Inventor: Tetsuo Nishida (Suwa, JP)
Assignee: Seiko Epson Corporation
H03L7/26G04F5/145H01L31/16H01L33/40H01L33/60H01L33/64H01S5/00H01S5/18302H01S5/02461H01S5/0425H01S5/18311H01S5/343H01S2301/176
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Quick Facts
Patent No.
US 10,097,191
App. No.
15/332,185
Granted
Oct 9, 2018
Kind
B2
Abstract

An atomic oscillator includes a gas cell having alkali metal atoms sealed therein; alight source that irradiates the gas cell with light; and a light detecting unit that detects the quantity of light transmitted through the gas cell. The light source includes an optical oscillation layer having a first reflective layer, an active layer, and a second reflective layer laminated therein in this order, an electrical field absorption layer having a first semiconductor layer, a quantum well layer, and a second semiconductor layer laminated therein in this order, and a heat diffusion layer that is disposed between the optical oscillation layer and the electrical field absorption layer and has a higher thermal conductivity than that of the second reflective layer.

Claims (15)

1. An atomic oscillator comprising:

a gas cell having alkali metal atoms sealed therein;

a light source that irradiates the gas cell with light; and

a light detecting unit that detects the quantity of light transmitted through the gas cell,

wherein the light source includes

an optical oscillation layer having a first reflective layer, an active layer, and a second reflective layer laminated therein in this order,

an electrical field absorption layer having a first semiconductor layer, a quantum well layer, and a second semiconductor layer laminated therein in this order, and

a heat diffusion layer that is disposed between the optical oscillation layer and the electrical field absorption layer and has a higher thermal conductivity than that of the second reflective layer.

2. The atomic oscillator according to claim 1 ,

wherein the heat diffusion layer is an i-type AlAs layer.

3. The atomic oscillator according to claim 1 ,

wherein the heat diffusion layer is an i-type GaAs layer.

4. The atomic oscillator according to claim 1 , further comprising:

a contact layer provided between the heat diffusion layer and the first semiconductor layer,

wherein a surface of the contact layer where the first semiconductor layer is disposed is provided with an electrode for applying a voltage to the electrical field absorption layer.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 23, 2022
From: SEIKO EPSON CORPORATION
To: MICROCHIP TECHNOLOGY INCORPORATED
Reel/Frame 061301/0770 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 24, 2016
From: NISHIDA, TETSUO
To: SEIKO EPSON CORPORATION
Reel/Frame 040102/0133 →
Priority Claims (1)
JP 2015-210824 · Oct 27, 2015 · national
Continuity (1)
Related Publication 20170117911A1 · Apr 27, 2017