Coating compositions for use with an overcoated photoresist
Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that in a first aspect comprise a crosslinker component that comprises a structure of the following Formula (I):
1. A method, comprising:
a) applying on a substrate a layer of a coating composition comprising a resin that comprises one or more glycoluril groups of Formula (I):
wherein in Formula (I):
at least one of R 1 and R 2 is other than hydrogen or a resin linker;
each R is the same or different and independently selected from a resin linker, hydrogen, optionally substituted alkyl, optionally substituted heteroalkyl, or optionally substituted carbocyclic aryl;
wherein at least one R group is an optionally substituted carbon alicyclic group, or an optionally substituted carbocyclic aryl group; and
b) applying a layer of a photoresist composition above the coating composition layer,
provided that one R is the resin linker, and the one or more glycouril groups are pendant moieties of a backbone of the resin.
2. The method of claim 1 wherein at least one of R 1 and R 2 is optionally substituted alkyl or optionally substituted heteroalkyl.
3. The method of claim 1 wherein the resin comprises 1) polyester linkages and/or 2) polymerized isocyanurate groups.
4. The method of claim 1 wherein the photoresist composition is imaged with activating radiation and the photoresist composition with activating radiation and developing the imaged photoresist composition layer to provide a photoresist relief image.
5. The method of claim 1 wherein the resin comprises a structure derived from formulae 1, 2, 3, 4, 5, 6, 7 or 8:
wherein in formulae 1, 2, 3, 4, 5, 6, 7 and 8, R 1 , R 2 , R 3 and R 4 are independently selected from a resin linker, hydrogen, optionally substituted alkyl, optionally substituted heteroalkyl, or optionally substituted carbocyclic aryl, and at least one of R 1 , R 2 , R 3 and R 4 is an optionally substituted carbon alicyclic group, an optionally substituted carbocyclic aryl group.
6. The method of claim 1 wherein in Formula (I) one or more R groups comprise an optionally substituted carbon alicyclic group.
7. The method of claim 1 wherein in Formula (I) one or more R groups comprise an optionally substituted heteroalkyl moiety.
8. The method of claim 1 wherein in Formula (I) one or more R groups comprise an optionally substituted alkoxy, optionally substituted alkylthio, or optionally substituted heteroalicyclic.
9. The method of claim 1 wherein the resin comprises a structure derived from one or more of the following:
10. The method of claim 1 wherein in Formula (I) one or more R groups comprise an optionally substituted alkoxy.
11. The method of claim 1 wherein in Formula (I) one or more R groups comprise an optionally substituted alkylthio.
12. The method of claim 1 further comprising exposing the photoresist composition layer to patterned activating radiation.
13. The method of claim 12 wherein the resin comprises a chromophore group for the activating radiation.
14. The method of claim 1 wherein the resin comprises a phenyl group.
15. The method of claim 1 wherein one or more R groups comprise a carbocyclic aryl moiety.
16. The method of claim 1 wherein one or more R group is phenyl.
17. A method, comprising:
a) applying on a substrate a layer of coating composition comprising a resin that comprises one or more glycoluril groups of Formula (I)
wherein in Formula (I):
at least one of and R 2 and R 2 is other than hydrogen or a resin linker,
each R is the same or different and independently selected from a resin linker, hydrogen, optionally substituted alkyl, optionally substituted heteroalkyl, or optionally substituted carbocyclic aryl,
wherein at least one R group is an optionally substituted carbon alicyclic group, or an optionally substituted carbocyclic aryl group, and
one or more R groups comprise an optionally substituted alkoxy or optionally substituted optionally substituted alkylthio; and
b) applying a layer of a photoresist composition above the coating composition layer,
provided that one R is the resin linker, and the one or more glycouril groups are pendant moieties of a backbone of the resin.
18. The method of claim 17 wherein in Formula (I) one or more R groups comprise an optionally substituted alkoxy.
19. The method of claim 17 wherein in Formula (I) one or more R groups comprise an optionally substituted alkylthio.