THIN FILM BATTERY DEVICE HAVING RECESSED SUBSTRATE AND METHOD OF FORMATION
A device. The device may include: a substrate, the substrate comprising: an upper surface; and a recess extending from the upper surface into the substrate; an active device region, the active device region disposed within the recess and having a first thickness; and an encapsulant, the encapsulant disposed over the recess and over the active device region, wherein the encapsulant has a second thickness, wherein the encapsulant extends above the upper surface of the substrate to a first distance, and wherein the first distance is less than a sum of the first thickness and second thickness.
1 . A device, comprising:
a substrate, the substrate comprising:
an upper surface; and
a recess extending from the upper surface into the substrate;
an active device region, the active device region disposed within the recess and having a first thickness; and
an encapsulant, the encapsulant disposed over the recess and over the active device region, wherein the encapsulant has a second thickness, wherein the encapsulant extends above the upper surface of the substrate to a first distance, and wherein the first distance is less than a sum of the first thickness and second thickness.
2 . The device of claim 1 , wherein the recess extends to a first depth from the upper surface into the substrate, wherein the first depth is greater than or equal to the first thickness.
3 . The device of claim 1 , the active device region comprising a plurality of layers.
4 . The device of claim 3 , wherein the device is a thin film battery, the plurality of layers comprising:
a cathode current collector;
a lithium-containing cathode;
a solid state electrolyte disposed on the lithium-containing cathode; and
an anode region disposed on the solid state electrolyte;
and an anode current collector disposed on the anode region, the anode current collector being further disposed adjacent the encapsulant.
5 . The device of claim 1 , wherein the encapsulant comprises a plurality of layers, wherein the plurality of layers comprises at least one rigid layer and at least one polymer layer.
6 . The device of claim 1 , wherein a portion of the encapsulant is disposed around the active device region within the recess.
7 . The device of claim 1 , further comprising a planarizing polymer layer disposed between the encapsulant and the active device region.
8 . The device of claim 7 , wherein the planarizing polymer layer comprises a cured polymer.
9 . The device of claim 7 , wherein the planarizing polymer layer comprises at least one of: an elongation till break of 70% or greater and an elastic modulus of less than 20 GPa.
10 . A thin film battery, comprising:
a substrate, the substrate comprising:
an upper surface; and
a recess extending from the upper surface into the substrate along a first direction;
an active device region, the active device region being disposed within the recess and having a first thickness, wherein the active device region comprises:
a lithium-containing cathode;
a solid state electrolyte disposed on the lithium-containing cathode; and
an anode region disposed on the solid state electrolyte; and
an encapsulant disposed on the active device region, wherein the encapsulant comprises:
at least one rigid layer; and
at least one polymer layer.
11 . The thin film battery of claim 10 , wherein the encapsulant has a second thickness, wherein the encapsulant extends above the upper surface of the substrate to a first distance, and wherein the first distance is less than a sum of the first thickness and second thickness.
12 . The thin film battery of claim 10 , wherein the recess comprises a localized height variation along the first direction.
13 . The thin film battery of claim 10 , wherein the active device region further comprises an anode current collector and a cathode current collector, the anode current collector and the cathode current collector extending onto the upper surface of the substrate.
14 . The thin film battery of claim 10 wherein the at least one polymer layer is encapsulated within the encapsulant.
15 . A method of forming a device, comprising:
providing a substrate having an upper surface;
forming a recess within the substrate, the recess extending from the upper surface into the substrate;
forming an active device region within the recess, the active device region having a first thickness; and
forming an encapsulant over the active device region, wherein the encapsulant has a second thickness, and wherein the encapsulant extends above the upper surface of the substrate to a first distance, wherein the first distance is less than a sum of the first thickness and second thickness.
16 . The method of claim 15 , wherein the forming the active device region comprises:
depositing a cathode current collector;
depositing a lithium-containing cathode layer on the cathode current collector;
depositing a solid state electrolyte layer on the lithium-containing cathode layer;
depositing an anode layer of the solid state electrolyte layer;
depositing an anode current collector; wherein the cathode current collector, the lithium-containing cathode layer, solid state electrolyte, the anode layer, and the anode current collector form an active device stack; and
patterning the active device stack to define a patterned stack disposed within the recess.
17 . The method of claim 15 , wherein the forming the encapsulant comprises:
depositing a polymer layer; and
depositing a rigid layer, wherein the polymer layer and the rigid layer form a stack of layers.
18 . The method of claim 15 wherein the forming the recess comprises:
forming a substrate precursor in a green state;
molding the substrate precursor to form a recessed structure having an initial size in the substrate precursor; and
heating the substrate precursor to form the recess in the substrate, wherein the recess has a final size different from the initial size.
19 . The method of claim 15 wherein the forming the recess comprises:
providing the substrate as a planar substrate; and
etching the substrate to form the recess using laser micromachining, or using lithographic patterning and etching.