Membrane laminate
A laminate is provided comprising at least one polysulfone and/or polyethersulfone porous membrane heat bonded to a polyvinylidene fluoride substrate.
1. A process of forming a filtration device comprising providing a at least one porous ultrafiltration membrane selected from the group consisting of polysulfone, polyethersulfone, blends thereof and copolymers thereof; providing a first and a second support plate wherein the first and second support plates are formed of PVDF, the support plates having a first surface facing each other and a second surface opposite the first surface of each plate and the plates having at least one port formed from the first surface to the second surface of each plate respectively; heat bonding the at least one ultrafiltration membrane to a first surface of the first support plate such that the PVDF melts and the molten PVDF infiltrates into pores in the membrane; and heat bonding the first surface of the first plate to the first surface of the second plate in an area outside of the area of the first surface of the first plate to which the membrane has been bonded.
2. The process of claim 1 wherein the first surface of the first plate is bonded to the first surface of the second plate about the periphery of each.
3. The process of claim 1 further comprising providing a heating element heated to a temperature of from about 490° F. (254° C.) to about 530° F. (277° C.) and applying the heating element to the membrane at a desired bond area which overlaps with at least a portion of the first surface of the first support plate and removing the heating element and allowing the bond to cool.
4. The process of claim 1 further comprising providing a heating element heated to a temperature of from about 490° F. (254° C.) to about 530° F. (277° C.); applying the heating element to the membrane at a desired bond area which overlaps with at least a portion of the first surface of the first support plate with sufficient pressure to assure intimate contact between the membrane and the first surface of the support plate and removing the heating element and allowing the bond to cool.
5. The process of claim 1 further comprising providing a heating element heated to a temperature of from about 284° F. (140° C.) and about 530° F. (277° C.) and applying the heating element to the first surface of the second support plate at a desired bond area; removing the heating element and contacting the first surface of the second support plate to the first surface of the first plate.
6. The process of claim 1 further comprising providing a heating element heated to a temperature of from about 284° F. (140° C.) and about 530° F. (277° C.) and applying the heating element to the first surface of the second support plate at a desired bond area; removing the heating element and contacting the first surface of the second support plate to the first surface of the first plate wherein the first surface of the first plate is bonded to the first surface of the second plate about the periphery of each.