Nano-textured biocompatible antibacterial film
Techniques and devices including a biocompatible antibacterial film are provided. An example method for depositing a biocompatible antibacterial film using physical vapor deposition (PVD) includes providing a substrate in a PVD processing chamber, forming a deposited film by co-depositing a first material and a second material onto the substrate from a vapor plume, wherein at least the first material is biocompatible and at least the second material is antibacterial, and nano-texturing the deposited film to produce nano-scale surface asperities that provide at least one of inhibition of bacterial growth, promotion of osseointegration, promotion of epithelial attachment, or promotion of endothelial attachment.
1. A method of depositing a biocompatible antibacterial film using ion beam assisted deposition (IBAD) comprising:
providing a substrate in a IBAD processing chamber;
forming a deposited film by co-depositing a first material and a second material onto the substrate from a vapor plume, wherein the vapor plume initially includes the first material and the second material is added to the vapor plume such that forming the deposited film is characterized by an initial layer comprising the first material and a second layer comprising a combination of the first and the second materials, wherein at least the first material is biocompatible and at least the second material is antibacterial; and
simultaneously nano-texturing the deposited film through at least a portion of its thickness to produce nano-scale surface asperities by concurrent bombardment with an ion beam having an energy of 50 eV-3000 eV, and a roughness of the nano-texture of the deposited film is in a range from 5-1000 nanometers.
2. The method of claim 1 wherein the nano-texturing the deposited film provides for at least one of inhibition of bacterial growth, promotion of osseointegration, promotion of epithelial attachment, or promotion of endothelial attachment.
3. The method of claim 1 further comprising forming the deposited film and nano-texturing the deposited film in the presence of an ion:evaporant atom arrival ratio, R, of 0.02≤R≤1.
4. The method of claim 1 further comprising:
backfilling the processing chamber with a reactive gas; and
forming the deposited film in the presence of the reactive gas such that the deposited film includes a ceramic component, the ceramic component being composed of the first material and an element of the reactive gas.
5. The method of claim 1 comprising:
selecting a ratio of the first material and the second material; and
forming the deposited film by co-depositing the first material and the second material using the selected ratio.
6. The method of claim 1 wherein the substrate comprises one or more of a dental implant, a percutaneous device, an osseointegrated device, a percutaneous osseointegrated prosthesis, an orthopedic joint replacement, an orthopedic fixation pin, an orthopedic fixation plate, a percutaneous cochlear implant, a spinal disk replacement device, or a vascular device.
7. The method of claim 1 wherein the initial layer is less than or equal to 5000 angstroms thick.
8. The method of claim 1 wherein the initial layer is approximately 500 angstroms thick.
9. The method of claim 1 wherein the second material is gradually added to the vapor plume at an increasing rate.
10. The method of claim 9 wherein forming the deposited film includes a subsequent third layer following the second layer, wherein the vapor plume is substantially composed of the second material.