LOW REFLECTIVE GLASS MEMBER AND METHOD FOR PRODUCING LOW REFLECTIVE GLASS MEMBER
To provide a method whereby a low reflective glass member can be produced efficiently at low cost, and a low reflective glass member. The method for producing a low reflective glass member ( 10 ) comprises immersing a glass substrate ( 12 ) made of borosilicate glass in an aqueous potassium hydrogencarbonate solution, to form a porous layer ( 14 ) at the surface of the glass substrate ( 12 ), wherein the temperature of the aqueous potassium hydrogencarbonate solution is preferably from 30 to 90° C., the time for immersing the glass substrate ( 12 ) in the aqueous potassium hydrogencarbonate solution is preferably from 0.5 to 24 hours, and the thickness of the porous layer ( 14 ) is preferably from 10 to 100,000 nm.
1 . A method for producing a low reflective glass member, which comprises immersing a glass substrate made of borosilicate glass in an aqueous potassium hydrogencarbonate solution to form a porous layer at the surface of the glass substrate.
2 . The method for producing a low reflective glass member according to claim 1 , wherein the temperature of the aqueous potassium hydrogencarbonate solution is from 30 to 90° C.
3 . The method for producing a low reflective glass member according to claim 1 , wherein the time for immersing the glass substrate in the aqueous potassium hydrogencarbonate solution is from 0.5 to 24 hours.
4 . The method for producing a low reflective glass member according to claim 1 , wherein the concentration of potassium hydrogencarbonate in the aqueous potassium hydrogencarbonate solution is from 0.01 to 5.0 mol/L.
5 . The method for producing a low reflective glass member according to claim 1 , wherein the thickness of the porous layer is from 10 to 100,000 nm.
6 . The method for producing a low reflective glass member according to claim 1 , wherein the glass substrate made of borosilicate glass comprises, as represented by mass percentage based on the following oxides,
from 55 to 85% of SiO 2 ,
from 2 to 30% of B 2 O 3 ,
from 1 to 18% in total of at least one member selected from Li 2 O, Na 2 O and K 2 O, and
from 0 to 5% of Al 2 O 3 .
7 . A low reflective glass member having a porous layer at the surface of a glass substrate, wherein
the porous layer has an inner surface facing the glass substrate, an outer surface opposed to the inner surface, and a virtual intermediate plane, of which the distance from the inner surface and the distance from the outer surface are equal,
the porosity of the portion from the outer surface to the intermediate plane of the porous layer, is larger by at least 0.1 than the porosity of the portion from the inner surface to the intermediate plane of the porous layer.
8 . The low reflective glass member according to claim 7 , wherein the thickness of the porous layer is from 10 to 100,000 nm.
9 . The low reflective glass member according to claim 7 , wherein the glass substrate is made of borosilicate glass.
10 . The low reflective glass member according to claim 9 , wherein the borosilicate glass comprises, as represented by mass percentage based on oxides,
from 55 to 85% of SiO 2 ,
from 2 to 30% of B 2 O 3 ,
from 1 to 18% in total of at least one member selected from Li 2 O, Na 2 O and K 2 O, and
from 0 to 5% of Al 2 O 3 .