Display device and manufacturing method of the same
Provided is a manufacturing method of a display device, which includes: forming a first electrode; forming a first insulating film covering an edge portion of the first electrode and having an opening portion overlapping with the first electrode; forming an EL layer over the first electrode and the first insulating film; forming a second electrode over the EL layer; forming a second insulating film over the second electrode so as to overlap with the first insulating film; removing the second insulating film; and forming a sealing film over the second electrode.
1. A manufacturing method of a display device, the manufacturing method comprising:
forming a first electrode;
forming a first insulating film covering an edge portion of the first electrode and having an opening portion overlapping with the first electrode;
forming an EL layer over the first electrode and the first insulating film;
forming a second electrode over the EL layer;
forming a second insulating film over the second electrode so as to overlap with the first insulating film;
removing the second insulating film; and
forming a sealing film over the second electrode,
wherein the second insulating film is formed so as to have a flat top surface over the first insulating film.
2. The manufacturing method according to claim 1 ,
wherein the second insulating film is formed so as to cover the first insulating film.
3. The manufacturing method according to claim 1 ,
wherein the removal of the second insulating film is carried out with a plasma treatment.
4. The manufacturing method according to claim 3 ,
wherein the plasma treatment is performed in the presence of a gas including oxygen.
5. The manufacturing method according to claim 3 ,
wherein the plasma treatment is performed so that the second insulating film is anisotropically etched.
6. The manufacturing method according to claim 1 ,
wherein the first insulating film and the second insulating film each comprise an organic compound.
7. The manufacturing method according to claim 6 ,
wherein the organic compound includes an acrylic resin.
8. The manufacturing method according to claim 1 ,
wherein the first insulating film and the second insulating film include the same material.
9. The manufacturing method according to claim 1 ,
wherein the sealing film comprises:
a first layer including an inorganic compound;
a second layer over the first layer, the second layer including an organic compound; and
a third layer over the second layer, the third layer including an inorganic compound.
10. A manufacturing method of a display device, the manufacturing method comprising:
forming a first electrode;
forming a first insulating film covering an edge portion of the first electrode and having an opening portion overlapping with the first electrode;
forming an EL layer over the first electrode and the first insulating film;
arranging a mask having an opening portion between the first insulating film and an evaporation source so as to be in contact with the first insulating film;
forming a second electrode over the EL layer through the opening portion of the mask;
forming a second insulating film over the second electrode so as to overlap with the first insulating film;
removing the second insulating film; and
forming a sealing film over the second electrode.
11. The manufacturing method according to claim 10 ,
wherein the second insulating film is formed so as to cover the first insulating film.
12. The manufacturing method according to claim 10 ,
wherein the second insulating film is formed so as to have a flat top surface over the first insulating film.
13. The manufacturing method according to claim 10 ,
wherein the removal of the second insulating film is carried out with a plasma treatment.
14. The manufacturing method according to claim 13 ,
wherein the plasma treatment is performed in the presence of a gas including oxygen.
15. The manufacturing method according to claim 13 ,
wherein the plasma treatment is performed so that the second insulating film is anisotropically etched.
16. The manufacturing method according to claim 10 ,
wherein the first insulating film and the second insulating film each comprise an organic compound.
17. The manufacturing method according to claim 16 ,
wherein the organic compound includes an acrylic resin.
18. The manufacturing method according to claim 10 ,
wherein the first insulating film and the second insulating film include the same material.
19. The manufacturing method according to claim 10 ,
wherein the sealing film comprises:
a first layer including an inorganic compound;
a second layer over the first layer, the second layer including an organic compound; and
a third layer over the second layer, the third layer including an inorganic compound.
20. The manufacturing method according to claim 10 ,
wherein the second insulating film is formed so as to cover a damaged portion of the first insulating film, the damaged portion resulting from contact with the mask.
21. The manufacturing method according to claim 20 ,
wherein the damaged portion has a depression, and
wherein the second insulating film is formed so as to fill the depression.
22. The manufacturing method according to claim 10 ,
wherein a part of the first insulating film is removed when the second insulating film is removed.
23. The manufacturing method according to claim 21 ,
wherein the second insulating film is removed so that a part of the second insulating film remains in the depression.
24. The manufacturing method according to claim 1 ,
wherein the removal of the second insulating film is performed so that a part of the second insulating film is left in the first insulating film.
25. The manufacturing method according to claim 10 ,
wherein the removal of the second insulating film is performed so that a part of the second insulating film is left in the first insulating film.