Bent-bridge semiconductive apparatus
A bent-bridge semiconductive apparatus includes a silicon bridge that is integral to a semiconductive device and the silicon bridge is deflected out of planarity. The silicon bridge may couple two semiconductive devices, all of which are from an integral processed die.
1. A bent-bridge semiconductive apparatus comprising:
a first semiconductive device;
a silicon bridge that is integrally part of the first semiconductive device, wherein the silicon bridge is deflected out of planarity with respect to the first semiconductive device, and
electrical connection selected from the group consisting of an electrical bump and a redistribution layer coupled to the first semiconductive device at metallization on an active surface thereof.
2. The bent-bridge semiconductive apparatus of claim 1 , further including a subsequent semiconductive device that is integrally part of the first semiconductive device, and wherein the subsequent semiconductive device is spaced apart from the first semiconductive device by the silicon bridge.
3. The bent-bridge semiconductive apparatus of claim 1 , wherein the silicon bridge is a first silicon bridge, further including:
a subsequent semiconductive device that is integrally part of the first semiconductive device, and wherein the subsequent semiconductive device is spaced apart from the first semiconductive device by the first silicon bridge;
a second semiconductive device that is integrally part of the first semiconductive device; and
a subsequent silicon bridge that is integrally part of the first semiconductive device, wherein the first and second semiconductive devices are spaced apart by the first silicon bridge, and wherein the second and subsequent semiconductive devices are spaced apart by the subsequent silicon bridge.
4. The bent bridge semiconductive apparatus of claim 1 , wherein the silicon bridge is a first silicon bridge, further including:
a subsequent semiconductive device that is integrally part of the first semiconductive device, and wherein the subsequent semiconductive device is spaced apart from the first semiconductive device by the first silicon bridge;
a second semiconductive device that is integrally part of the first semiconductive device;
a third silicon bridge that is integrally part of the first semiconductive device, wherein the second and third semiconductive devices are spaced apart by the third silicon bridge;
a third semiconductive device that is integrally part of the first semiconductive device; and
a subsequent silicon bridge that is integrally part of the first semiconductive device, wherein the third and subsequent semiconductive devices are spaced apart by the subsequent silicon bridge.
5. The bent-bridge semiconductive apparatus of claim 1 , further including:
a substrate coupled to the first semiconductive device at metallization by at least one of a pillar interconnect and an electrical bump.
6. The bent-bridge semiconductive apparatus of claim 1 , further including:
a substrate coupled to the first semiconductive device at metallization by at least one of a pillar interconnect and an electrical bump;
a subsequent semiconductive device that is integrally part of the first semiconductive device, and wherein the subsequent semiconductive device is spaced apart from the first semiconductive device by the silicon bridge.
7. The bent-bridge semiconductive apparatus of claim 1 , further including:
a substrate coupled to the first semiconductive device at metallization by at least one of a pillar interconnect and an electrical bump;
a subsequent semiconductive device that s integrally part of the first semiconductive device, and wherein the subsequent semiconductive device is spaced apart from the first semiconductive device by the silicon bridge, and wherein the subsequent semiconductive device is also coupled to the substrate device as metallization by at least one of a pillar and an electrical bump.
8. The bent-bridge semiconductive apparatus of claim 1 , wherein the silicon bridge is deflected out of planarity in a range from 1° to 180°.
9. The bent-bridge semiconductive apparatus of claim 1 , wherein the silicon bridge is a first silicon bridge, further including;
a second semiconductive device, wherein the first silicon bridge is integrally between the first semiconductive device and the second semiconductive device;
a second silicon bridge;
a third semiconductive device, wherein the second silicon bridge is integrally between the second semiconductive device and the third semiconductive device;
a third silicon bridge;
a fourth semiconductive device, wherein the third silicon bridge is integrally between the third semiconductive device and the fourth semiconductive device;
a subsequent silicon bridge, wherein the subsequent silicon bridge is integrally between the fourth semiconductive device and the subsequent semiconductive device; and
wherein the first, second, third, fourth and subsequent semiconductive devices are described along an arc.
10. The bent-bridge semiconductive apparatus of claim 9 , further including a mandrel that describes the arc.
11. The bent-bridge semiconductive apparatus of claim 9 , wherein each semiconductive device includes an active surface, and wherein the arc creates a convex form factor at the active surfaces.
12. The bent-bridge semiconductive apparatus of claim 9 , wherein each semiconductive device includes an active surface, and wherein the arc creates a concave form factor at the active surfaces.
13. The bent-bridge semiconductive apparatus of claim 1 , further including an active device within the silicon bridge, wherein the active device is part of a logic region.
14. The bent-bridge semiconductive apparatus of claim 1 , further including a connected die that is coupled to the first semiconductive device by a bond wire.
15. The bent-bridge semiconductive apparatus of claim 1 , further including a connected die that is coupled to the first semiconductive device by an electrical bump.
16. The bent-bridge semiconductive apparatus of claim 1 , wherein the silicon bridge is deflected out of planarity to form at least a portion of a helix.
17. A computing system containing bent-bridge semiconductive apparatus, comprising:
a first semiconductive device;
a silicon bridge that is integrally part of the first semiconductive device, wherein the silicon bridge is deflected out of planarity with respect to the first semiconductive device;
a subsequent semiconductive device that is integrally part of the first semiconductive device, and wherein the subsequent semiconductive device is spaced apart from the first semiconductive device by the silicon bridge, wherein the first and subsequent devices and the silicon bridge are affixed to a substrate;
a housing onto which the substrate is assembled, and
electrical connection selected from the group consisting of an electrical bump and a redistribution layer coupled to the first semiconductive device at metallization on an active surface thereof.
18. The computing system of claim 17 , wherein the housing is an outer shell.
19. A bent-bridge semiconductive apparatus comprising:
a first semiconductive device;
a silicon bridge electrically contacting the first semiconductive device, wherein the silicon bridge is deflected out of planarity with respect to the first semiconductive device, and
electrical connection selected from the group consisting of an electrical bump and a redistribution layer coupled to the first semiconductive device at metallization on an active surface thereof.
20. The bent-bridge semiconductive apparatus of claim 19 , further including a subsequent semiconductive device that is electrically contacting silicon bridge, and wherein the subsequent semiconductive device is spaced apart from the first semiconductive device by the silicon bridge.
21. The bent-bridge semiconductive apparatus of claim 19 , further including:
a second semiconductive device that is electrically contacting the silicon bridge, wherein the second semiconductive device is adjacent the first semiconductive device; and
a subsequent semiconductive device that is electrically contacting silicon bridge, and wherein the subsequent semiconductive device is spaced apart from the first semiconductive device by the silicon bridge where the silicon bridge is deflected out of planarity.
22. The bent-bridge semiconductive apparatus of claim 19 , further including:
a second semiconductive device that is electrically contacting the silicon bridge, wherein the second semiconductive device is adjacent the first semiconductive device;
a subsequent semiconductive device that is electrically contacting silicon bridge, and wherein the subsequent semiconductive device is spaced apart from the first semiconductive device by the silicon bridge where the silicon bridge is deflected out of planarity;
a third semiconductive device that is electrically contacting the silicon bridge, wherein the third semiconductive device is adjacent the subsequent semiconductive device, and
electrical connection selected from the group consisting of an electrical hump and a redistribution layer coupled to the first semiconductive device at metallization on an active surface thereof.