Method and apparatus for X-ray scatterometry
A method for X-ray scatterometry includes receiving a first distribution of an X-ray beam scattered from a sample. The first distribution exhibits asymmetry with respect to a reference axis. A correction is applied to the first distribution, so as to produce a second distribution in which a level of the asymmetry is reduced relative to the first distribution. One or more parameters of the sample are estimated based on the second distribution.
1. A system, comprising:
an X-ray source, which is configured to direct an X-ray beam on a sample;
a detector assembly, which is configured to detect one or more X-ray beams transmitted through and scattered from the sample, and to produce respective electrical signals in response to the detected X-ray beams; and
an X-ray beam stopper, which is only partially-opaque to X-rays, which is located between the sample and the detector assembly, and which is configured to partially-block and partially-transmit an intensity of one or more of the X-ray beams impinging thereon.
2. A system, comprising:
an X-ray source, which is configured to direct an X-ray beam on a sample;
a detector assembly, which is configured to detect one or more X-ray beams transmitted through and scattered from the sample over an angular range, and to produce respective electrical signals in response to the detected X-ray beams; and
an X-ray beam stopper, which is located between the sample and the detector assembly and comprises at least first and second beam-stopping elements, which are positioned simultaneously in the X-ray beam and are movable relative to one another so as to set a configurable effective width of the X-ray beam stopper by controlling an amount of overlap between the first and second beam-stopping elements, and which is configured to at least partially block an intensity of the X-ray beams within a configurable partial sector of the angular range, depending on the configurable effective width.
3. The system according to claim 2 , wherein the X-ray beam stopper comprises a rotatable beam stopping element, which is configured to rotate about an axis so as to set the effective width.
4. The system according to claim 2 , and comprising a processor, which is configured to adjust the effective width of the X-ray beam stopper responsively to a divergence angle of the X-ray beam.
5. The system according to claim 2 , and comprising a processor, which is configured is configured to adjust the effective width of the X-ray beam stopper responsively to a size of repetitive features on the sample.