IP Library Granted Patent US 9,905,571
Granted Patent B2
US 9,905,571 · App. 15/403,331 · Granted Feb 27, 2018

Nonvolatile semiconductor memory device and method of manufacturing the same

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Quick Facts
Patent No.
US 9,905,571
App. No.
15/403,331
Granted
Feb 27, 2018
Kind
B2
Abstract

According to one embodiment, a memory device includes first and second fin type stacked structures each includes first to i-th memory strings (i is a natural number except 1) that are stacked in a first direction, the first and second fin type stacked structures which extend in a second direction and which are adjacent in a third direction, a first portion connected to one end in the second direction of the first fin type stacked structure, a width in the third direction of the first portion being greater than a width in the third direction of the first fin type stacked structure, and a second portion connected to one end in the second direction of the second fin type stacked structure, a width in the third direction of the second portion being greater than a width in the third direction of the second fin type stacked structure.

Claims (48)

1. A nonvolatile semiconductor memory device comprising:

first and second units, each of the first and second units including first and second memory strings stacked in a first direction, each of the first and second memory strings having first and second ends in a second direction crossing the first direction;

a first portion having first and second nodes, the first node being electrically connected to the first end of the first memory string of the first unit, the second node being electrically connected to the first end of the second memory string of the first unit, the first ends of the first and second memory strings of the second unit being electrically isolated from the first and second nodes;

a second portion having third and fourth nodes, the third node being electrically connected to the second end of the first memory string of the second unit, the fourth node being electrically connected to the second end of the second memory string of the second unit, the second ends of the first and second memory strings of the first unit being electrically isolated from the third and fourth nodes;

a first bit line being electrically connected to the first and third nodes; and

a second bit line being electrically connected to the second and fourth nodes.

2. The device of claim 1 , further comprising:

first and second transistors having gate electrodes electrically connected to one another, the first transistor being provided between the first memory string of the first unit and the first node, the second transistor being provided between the second memory string of the first unit and the second node; and

third and fourth transistors having gate electrodes electrically connected to one another, the third transistor being provided between the first memory string of the second unit and the third node, the fourth transistor being provided between the second memory string of the second unit and the fourth node,

wherein the gate electrodes of the first and second transistors, and the gate electrodes of the third and fourth transistors are isolated from one another.

3. The device of claim 1 , further comprising:

a first source line electrically connected to the second ends of the first and second memory strings of the first unit; and

a second source line electrically connected to the first ends of the first and second memory strings of the second unit.

4. The device of claim 3 , further comprising:

first and second transistors having gate electrodes electrically connected to one another; and

third and fourth transistors having gate electrodes electrically connected to one another, wherein

the first transistor is provided between the first source line and the second end of the first memory string of the first unit,

the second transistor is provided between the first source line and the second end of the second memory string of the first unit,

the gate electrodes of the first and second transistors extend in a third direction crossing the first direction and the second direction,

the third transistor is provided between the second source line and the first end of the first memory string of the second unit,

the fourth transistor is provided between the second source line and the first end of the second memory string of the second unit, and

the gate electrodes of the third and fourth transistors extend in the third direction.

5. The device of claim 1 , wherein

the first ends of the first and second memory strings of the second unit are physically separated from the first portion, and

the second ends of the first and second memory strings of the first unit are physically separated from the second portion.

6. The device of claim 1 , wherein

the first ends of the first and second memory strings of the second unit are physically combined with the first portion, and

the second ends of the first and second memory strings of the first unit are physically combined with the second portion.

7. The device of claim 1 , wherein

each of the first and second memory strings includes memory cells connected in series.

8. The device of claim 1 , further comprising:

control gate lines extending in a third direction crossing the first direction and the second direction, the control gate lines being shared by the first and second memory strings of the first and second units.

9. The device of claim 1 , wherein

the first and second bit lines extend in the second direction above an area in which the first and second units are provided.

10. The device of claim 1 , wherein

the first and second bit lines extend in the second direction above an area except an area in which the first and second units are provided.

11. The device of claim 1 , further comprising:

first and second transistors having gate electrodes electrically connected to one another, wherein

each of the first and second units has first and second ends in the second direction,

the first end of each of the first and second units is located on the first end side of the first and second memory strings of each of the first and second units, the second end of each of the first and second units is located on the second end side of the first and second memory strings of each of the first and second units,

the first transistor is provided between the second end of the first memory string of the first unit and the second end of the first unit, the second transistor is provided between the second end of the second memory string of the first unit and the second end of the first unit, and

the gate electrodes of the first and second transistors extend in a third direction crossing the first direction and the second direction.

12. The device of claim 11 , further comprising:

third and fourth transistors having gate electrodes electrically connected to one another, wherein

the third transistor is provided between the first end of the first memory string of the second unit and the first end of the second unit, the fourth transistor is provided between the first end of the second memory string of the second unit and the first end of the second unit, and

the gate electrodes of the third and fourth transistors extend in the third direction.

13. The device of claim 11 , wherein

the first and second units are adjacent to one another in the third direction.

Assignments (4)
MERGER Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: K.K. PANGEA
Reel/Frame 055659/0471 →
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 055669/0001 →
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 055669/0401 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 22, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043620/0798 →