Method of forming an electrical interconnect
View Patent ↗A method of forming an electrical interconnect includes etching a lattice pattern into a contact pad on a circuit substrate as a first connection point, at least partially filling the lattice pattern with a conductive epoxy, contacting the conductive epoxy with a second connection point, and curing the epoxy.
1. A method of forming an electrical interconnect, comprising:
etching a three-dimensional lattice pattern into a contact pad on a circuit substrate as a first connection point;
at least partially filling the lattice pattern with a conductive epoxy;
contacting the conductive epoxy with a second connection point to form a three-dimensional electrical connection between the contact pad as a first connection point and the second connection point; and
curing the epoxy.
2. The method of claim 1 , wherein the lattice pattern is etched into the contact pad adjacent a gap in the circuit substrate.
3. The method of claim 1 , wherein the conductive epoxy encapsulates the lattice pattern.
4. The method of claim 1 , wherein the lattice includes at least one round opening.
5. The method of claim 1 , wherein the lattice includes two intersecting linear portion defining four quadrant openings.
6. The method of claim 1 , further comprising applying a coverlay material to the circuit substrate such that a portion of the contact pad resides under the coverlay material and resides between the first and second connection points separate from the conductive epoxy.
7. The method of claim 6 , wherein at least partially filling the lattice pattern with the conductive epoxy comprising filling the lattice pattern with the epoxy such that a height of the epoxy exceeds a height of the first connection point.
8. The method of claim 1 , wherein the lattice pattern comprises an array of circular openings.
9. The method of claim 8 , wherein each of the circular openings have a same radius.
10. The method of claim 1 , wherein the conductive epoxy comprises one of silver epoxy or carbon-tube impregnated epoxy.
11. A method of forming an electrical interconnect, comprising:
etching a three-dimensional lattice pattern into a contact pad on a circuit substrate as a first connection point;
attaching a coverlay to the circuit substrate such that that first connection point resides at least partially under the coverlay material;
at least partially filling the lattice pattern with a conductive epoxy;
contacting the conductive epoxy with a second connection point to form a three-dimensional electrical connection between the contact pad as a first connection point and the second connection point;
curing the epoxy.
12. The method of claim 11 , wherein the lattice pattern is etched into the contact pad adjacent a gap in the circuit substrate.
13. The method of claim 11 , wherein the conductive epoxy encapsulates the lattice pattern.
14. The method of claim 11 , wherein the lattice includes at least one round opening.
15. The method of claim 11 , wherein the lattice includes two intersecting linear portion defining four quadrant openings.
16. The method of claim 11 , wherein at least partially filling the lattice pattern with the conductive epoxy comprising filling the lattice pattern with the epoxy such that a height of the epoxy exceeds a height of the first connection point.
17. The method of claim 11 , wherein the conductive epoxy comprises one of silver epoxy or carbon-tube impregnated epoxy.