IP Library Granted Patent US 9,849,208
Granted Patent B2
US 9,849,208 · App. 15/412,825 · Granted Dec 26, 2017

Flexible ion generation device

Inventor: Charles Houston Waddell (Roanoke, VA)
Assignee: Global Plasma Solutions
A61L9/22H01J33/02A61L2209/16
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Quick Facts
Patent No.
US 9,849,208
App. No.
15/412,825
Granted
Dec 26, 2017
Kind
B2
Abstract

The present invention provides methods and systems for the flexible ion generation device includes at least one dielectric layer, at least one trace having a first end and a second end, the at least one trace is engaged to the at least one dielectric layer, and at least one emitter engaged to the trace for emitting ions.

Claims (30)

1. A flexible ion generation device, comprising:

at least one dielectric layer;

at least one trace having a first end and a second end, the at least one trace is engaged to the at least one dielectric layer; and

at least one emitter engaged to the trace for emitting ions.

2. The flexible ion generation electrode according to claim 1 , wherein the emitter has a first end and a second end, the first end of the emitter is engaged to the trace and the second end extends away from the trace and contains a point for emitting ions.

3. The flexible ion generation device according to claim 1 , wherein the trace is composed of copper.

4. The flexible ion generation device according to claim 1 , further comprising a first dielectric layer and a second dielectric layer with a trace disposed therebetween.

5. The flexible ion generation device according to claim 1 , further comprising a connector engaged to the first end and the second end of the trace.

6. The flexible ion generation device according to claim 1 , further comprising a brush, containing a plurality of bristles, wherein the brush is engaged to the trace.

7. The flexible ion generation device according to claim 1 , further comprising a brush, containing a plurality of bristles, wherein the brush is engaged to the emitter.

8. A flexible ion generation device, comprising:

a first dielectric layer having a top portion, a bottom portion, a top side, a bottom side, a left side, and a right side;

a second dielectric layer having a top portion, a bottom portion, a top side, a bottom side, a left side, and a right side;

a trace positioned between the first dielectric layer and the second dielectric layer;

a plurality of emitters engaged to the trace and extending outward from the trace to either the top side or the bottom side of the first dielectric layer and the second dielectric layer.

9. The flexible ion generation device according to claim 8 , further comprising a point positioned on the emitter for emitting ions.

10. The flexible ion generation device according to claim 8 , wherein the second dielectric layer has a plurality of openings that are located over a portion of the emitter for allowing ions to be emitted.

11. The flexible ion generation device according to claim 8 , further comprising a brush engaged to the emitter for emitting ions.

12. The flexible ion generation device according to claim 8 , further comprising a brush engaged to the trace for emitting ions.

13. The flexible ion generation device according to claim 8 , further comprising a second trace engaged to the top portion of the second dielectric layer and a third dielectric layer having a top portion and a bottom portion, wherein the bottom portion of the third dielectric layer is engaged to the second trace and the top portion of the second dielectric layer.

14. The flexible ion generation device according to claim 8 , wherein the flexible ion generation device is mounted adjacent a heat exchanger located within a conduit.

15. The flexible ion generation device according to claim 8 , wherein the device is mounted inside a VRV/VRF air handling system.

16. A method of producing ions, comprising:

providing a flexible ion generation device with at least one dielectric layer, at least one trace having a first end and a second end, the at least one trace is engaged to the at least one dielectric layer, and at least one emitter engaged to the trace for dispersing ions;

mounting the flexible ion generation device within a conduit; and

positioning the at least one emitter within the airflow within the conduit.

17. The method of producing ions according to claim 16 , further comprising a power source engaged to the at least one connector.

18. The method of producing ions according to claim 16 , further comprising mounting the device after a prefilter and before a cooling coil.

19. The method of producing ions according to claim 16 , further comprising at least one brush engaged to the emitter for dispensing ions.

20. The method of producing ions according to claim 16 , further comprising a connector engaged to the first end and the second end of the at least one trace.

Assignments (5)
NOTICE OF GRANT OF SECURITY INTEREST IN PATENTS Recorded Dec 18, 2020
From: GLOBAL PLASMA SOLUTIONS, INC.
To: FIFTH THIRD BANK, NATIONAL ASSOCIATION, AS ADMINISTRATIVE AGENT
Reel/Frame 054806/0281 →
RELEASE OF SECURITY INTEREST Recorded Dec 10, 2020
From: FIDUS INVESTMENT CORPORATION
To: GLOBAL PLASMA SOLUTIONS, INC.
Reel/Frame 054610/0804 →
SECURITY INTEREST Recorded Oct 1, 2018
From: GLOBAL PLASMA SOLUTIONS, INC.
To: FIDUS INVESTMENT CORPORATION
Reel/Frame 047020/0553 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 25, 2018
From: GLOBAL PLASMA SOLUTIONS, LLC
To: GLOBAL PLASMA SOLUTIONS, INC.
Reel/Frame 046968/0065 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 31, 2017
From: WADDELL, CHARLES HOUSTON
To: GLOBAL PLASMA SOLUTIONS, LLC
Reel/Frame 041133/0491 →
Continuity (2)
Provisional Application 62281318 · Jan 21, 2016
Related Publication 20170232131A1 · Aug 17, 2017